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Capitolo quartoHitchman M. L., Jensen K. F., 1993, Chemical Vapour Deposition, Accademic Press, Bury St.Edmunds, Suffolk, Great Britain.Pierson H.O., 1992, Handbook of Chemical Vapour Deposition, Noyes Pubblication, ParkRidge, New Jersey.Habelard H. in Clusters of atoms and molecules I, edited by H.Havelard, Springer,Berlin(1995)207Kastner M., Artificial Atoms Physics Today, Vol. 46, No. 1, 24-31 (1993).G. A. Battiston, R. Gerbasi, A. Gasparotto, Chemical Vapor Deposition, 5, No.,1 (1999), 13Capitolo quintoW.R. Kroll and W. Naegele, , J.Organometal. Chem.,19p.439,(1969)S. Pasynkiewich and K Dowbor, J.Organometal. Chem., p.75,(1972)W.R. Kroll, I. Kuntz and E. Birnbaum, J.Organometal. Chem., p.313-320Wonyong Koh, Su-Jin and Yunsoo Kim; Thin Solid Films,304 p.222-224(1997).Capitolo sestoBecker W. , 1965 “Reaction of Grignard Compounds with Diborane: Characterization ofChloromagnesium Borohydride” Inorganic ChemistryBremer M., 2003 “ The structure of some amine of magnesium tetrahydroborate and DFTcalculations on solvates of lithium tetrahydroborate ”, Eur.J.Chem.Wiberg E.” Naturforsch”,1952,5,58-59