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DAFS - Universidad de Zaragoza

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Applications : Nanostructures III-V : BQ GaN/AlN<br />

GaN QDs (4ML)<br />

wetting layer (2ML)<br />

AlN buffer (40 ML)<br />

Saphir or SiC substrates<br />

AlN capping of a GaN/AlN QDs layer : strain,<br />

composition, mechanism ?<br />

AFM<br />

- Modified Stranski –<br />

Krastanow growth (MBE)<br />

- AlN, GaN mismatch :<br />

2,4 %<br />

Ga + N<br />

GaN thickness ><br />

critical thickness<br />

GaN QDs<br />

AlN<br />

RHEED<br />

35/50

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