Conference Program - LOPE-C 2011

SCIENTIFIC CONF. | WEDNESDAY-JUNE 29, 2011
Track 4
Printing Technologies (11:30 am - 01:20 pm) | LOCATION HARMONIE D / LEVEL C2
12:20 pm UV Lamp Design to Optimise UV Curing Processes in Printed Electronics
Ms Dawn Skinner,
Fusion UV Systems GmbH, Process Development Manager, Germany
UV curing is a technology that has grown and diversified widely over the past 30 years; from its early use in printing and wood coating through to applications in coating
industrial plastic components, bonding and coating applications in medical devices, glass coatings, protective coatings for optical fibres and specialised coatings on flexible
films, just as examples Its success has been driven by improved coating performance, fast cure speed, small compact units, economical use of energy and low heat impact
on the coating and substrate and, the potential for 100% solid coatings and adhesives. To meet the demands of high volume production with lower manufacturing costs, the
processes for organic electronics must be automated leading towards roll-to-roll applications. Additionally, many of the substrates used in printed electronics are heat
sensitive films, so low temperature curing of the coatings and inks is required to prevent distortion of the substrate. The rapid cure of UV inks and coatings and the low heat
impact of the process are key motivating factors for the interest in UV curing from the printed electronics manufacturers; with opportunities for UV curing in applications
including , encapsulants, barrier coatings, conductive inks and coatings, anti-reflective coatings. To achieve the best possible properties of a UV cured coating material, it is
essential to optimise the interaction between the chemistry and the UV lamp system. This paper will look at the issues of correlation between absorption characteristics of
the coating and emission spectrum of the UV lamp, as well as the influence of UV energy, irradiance and temperature on the UV curing process. In addition, the paper will
review the design of UV lamp systems and the installation of the curing units into manufacturing lines to optimise these key parameters.
12:40 pm Polymer Vapor Phase Deposition (PVPD®) as key-enabling technology for advanced polymer thin films
Mr Juergen Kreis,
AIXTRON SE, Senior Department Manager Business Development, Germany
PVPD? utilizes a carrier-gas enhanced vapour phase deposition approach for in-situ polymerization and layer formation of functional polymer thin films.
Compared to conventional solvent-based polymer deposition, PVPD realizes in-situ formation of polymer films in an all-dry-process, intrinsically avoiding respective
limitations of a wet-process. Integration of AIXTRON?s close-coupled showerhead (CCS®) technology ensures high deposition rates and free scalability of the process.
These advantages recommend PVPD for advanced and novel applications, where functional polymer thin films contribute to the overall performance with optimized
properties.
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