Conference Program - LOPE-C 2011
Conference Program - LOPE-C 2011
Conference Program - LOPE-C 2011
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SCIENTIFIC CONF. | THURSDAY-JUNE 30, <strong>2011</strong><br />
Track 5<br />
Novel Process Concepts (04:30 pm - 06:00 pm) | LOCATION HARMONIE E / LEVEL C2<br />
05:00 pm Selective Coating and Removal Technologies to Produce Patterned Films for Printed Electronics<br />
Mr Greg Gibson,<br />
nTact/FAS , President & CTO , United States<br />
Liquid chemistries are used to create a wide variety of functional layers in organic electronics. These materials are often deposited in the desired areas within the device<br />
structure using direct patterning methods. Alternately, these materials may be deposited over the entire substrate using a ?full coverage? coating method, and later partially<br />
removed to form the desired pattern. Direct patterning<br />
techniques offer the clear vantage of placement of the material in the desired location in a single step. However, existing techniques have some disadvantages, including<br />
direct contact with the substrate, relatively low throughput, roughness of the deposited film, and yield loss due to defects. Full<br />
coverage coating techniques can be used to produce a high quality film, but to generate the desired<br />
pattern subsequent steps such as photolithography or laser ablation are typically required, thus adding cost and complexity to the device fabrication process.<br />
nTact/FAS has developed a new set of technologies that combines an enhanced method of extrusion coating with a novel coating removal technique to produce patterned<br />
films. The Selective Coating method uses a specially designed extrusion coating die with multiple openings to define coated and<br />
uncoated areas (stripes) across the width of the substrate. This stripe coating method is combined with the ability to precisely start and stop the coating multiple times down<br />
the length of the substrate, thus<br />
enabling the deposition of an array of rectangular shapes. The Selective Removal technique uses a proprietary mechanism to remove portions of the coating immediately<br />
after deposition. The removal technique is non-contact, and has been successfully demonstrated to generate both rectilinear and<br />
complex shapes for a wide variety of coating materials. The coating edge profile after Selective Removal is sharp and well defined, comparing favorably with the edge of<br />
the initial coated film. Selective Coating and Selective Removal can be used independently or in conjunction, providing a unique and versatile means of adapting to process<br />
requirements.<br />
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