R&D Sources - Kurt J. Lesker Company

TORUS ® Magnetron Sputtering Cathodes
➤ R&D Sources
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Deposition Sources
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■ Overview
Kurt J. Lesker Company first started producing the TORUS ® line of
magnetron sputtering cathodes in the early 1980s. Nearly 25 years later,
we are a clear leader in the magnetron sputtering industry. As new
applications for sputtering continue to emerge, KJLC ® is well positioned
to lead the sputtering industry well into the future.
We have a comprehensive line of TORUS magnetron sputtering
products to address nearly any sputtering challenge. KJLC offers
a full line of standard and custom designed sputtering cathodes
for the thin film industry.
Our global support network includes a dedicated applications
and development lab, applications and technical support staff,
and a worldwide sales and service network backed by a 100%
customer satisfaction guarantee.
■ TORUS HV Circular
KJLC offers a comprehensive line of circular TORUS magnetron sputter
sources suited for most R&D applications. These sputter cathodes
range in size from one to four inches in diameter, are functional with
virtually any material, have exceptional target utilization, and can
be driven by RF, DC, or Pulsed-DC power supplies.
Engineered for Optimum Performance:
• Wide pressure range operation to 10-9 Torr
• Low outgassing
• Excellent thin film uniformity and deposition rates
• Efficient sputter target utilization
• Superior target hold down mechanism eliminates the need for
thermal pastes, keepers, etc.
• Compact, modular magnet array
• Magnets NOT exposed to vacuum
• Magnets NOT exposed to cooling water
• Cooling water is not exposed to vacuum chamber
during target change
Features:
• 25+ years of sputter cathode manufacturing experience
• 25+ years of sputtering system manufacturing
and integration expertise
• Full applications support and consultation
• Worldwide sales and service
• Extensive offering of R&D and Production cathodes
• Circular and linear designs
• Standard and customer-specific designs
• Cathode retrofit and rebuild services available
Contact our Process Equipment Division at ped@lesker.com to
discuss your specific vacuum application and process equipment needs.
Figure 1
(Axial Head Design)
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• Unbalanced operation and compatibility with magnetic materials
is available (please contact us at sputtering@lesker.com
for more information)
• Full line of accessories available (gas injection, chimneys,
shutters, cluster arrays, etc.)
• Custom sputter source configurations available

■ TORUS ® HV Circular (continued)
TORUS Configuration and Pricing Matrix
Select from the configuration options to create a part number
and price for the particular TORUS sputter source required.
Be sure to reference the Options table for valid options for
a given source size.
Figure 2
(Right Angle Head Design)
Figure 3
(Flex-Head Design)
E
NOTE: See www.lesker.com for current information and models
of Torus Sources.
TORUS ® Magnetron Sputtering Cathodes
➤ R&D Sources
Example Configuration: TM2RS10FBF is a 2" O.D. right angle mount head
on a 10" long tube with a standard magnet array mounted to
an 6" CF flange with gas injection and pneumatic shaft-style shutter.
Example configuration options selected shown in red below.
Part No. Prefix Base Price
For 1" O.D. Targets (0.063"–0.125") TM1 Call
For 2" O.D. Targets (0.080"–0.25") TM2 Call
For 3" O.D. Targets (0.080"–0.25") TM3 Call
For 4" O.D. Targets (0.080"–0.25") TM4 Call
Option Part No. Additional Price
Mounting Style
Axial A N/C
Right Angle R Call
Flex-Head F Call
Magnet Array
Standard S N/C
Magnetic Materials (Not avail. for TM1) M Call
Tube Length
10" 10 N/C
14" 14 N/C
Flange Size
6" CF Flange (1.26" offset) 6 Call
6" CF Flange (on-center) F Call
8" CF Flange (1.5" offset) 8 Call
8" CF Flange (on-center) K Call
(none) X N/C
Gas Injection
Gas Injection Ring G Call
Deposition Chimney (Not avail. for TM1) C Call
Gas Injection Ring and Chimney B Call
(none) X N/C
Shutter
Pneumatic Actuation Flip-Style F Call
Pneumatic Actuation Swing-Style S Call
(none) X N/C
Applicable Source Part No. Base Price
300W RF Package, 220 VAC TM1, TM2, TM3 RF03A22XX300 Call
600W RF Package, 220 VAC TM3, TM4 RF06A22XX300 Call
1kW RF Package, 220 VAC TM4 RF10A22XX300 Call
500W DC Package, 115 VAC TM1, TM2, TM3 DC05A12NN Call
500W DC Package, 208 VAC TM1, TM2, TM3 DC05B12NN Call
1.5kW RF Package, 208 VAC TM3, TM4 DC15B12NU Call
2.5kW RF Package, 208 VAC TM4 DC25B12NU Call
*All RF packages come with interconnect cables and a 3' cable from the tuner.
**All DC packages come with a 12' cable from the power supply.
NOTE: Unbalanced magnet arrays, custom tube lengths, and flange sizes, and
rotary style shutters available upon request. Some configurations may not
physically be compatible. Please contact ped@lesker.com for more information.
Options & Accessories Available
Head Dimensions (in.)* Deposition Gas Magnetic
Model Figure Mount Style A B C D E Chimney Injection Ring Materials
TM1 1 Axial 4.05 4.39 0.11 9.56 18.59 Yes Yes No
TM1 2 Right Angle 5.55 5.89 0.11 9.56 15.71 Yes Yes No
TM1 3 Flex 4.05 4.39 0.11 9.56 20.39 Yes Yes No
TM2 1 Axial 4.08 4.49 0.11 9.56 18.69 Yes Yes Yes
TM2 2 Right Angle 5.58 5.99 0.11 9.56 15.71 Yes Yes Yes
TM2 3 Flex 4.08 4.49 0.11 9.56 20.98 Yes Yes Yes
TM3 1 Axial 3.41 3.90 0.11 9.56 18.11 Yes Yes Yes
TM3 2 Right Angle 4.91 5.40 0.11 9.56 15.71 Yes Yes Yes
TM3 3 Flex 3.41 3.90 0.11 9.56 20.39 Yes Yes Yes
TM4 1 Axial 3.66 4.16 0.11 9.56 18.37 Yes Yes Yes
TM4 2 Right Angle 5.16 5.66 0.11 9.56 15.71 Yes Yes Yes
TM4 3 Flex 3.66 4.16 0.11 9.56 20.65 Yes Yes Yes
* NOTE: Dimensions involving flange-to-target thickness assume a standard target thickness of 1 /8". Add or subtract accordingly based on your particular sputter target size.
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Deposition Sources

TORUS ® Magnetron Sputtering Cathodes
➤ R&D Sources
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Deposition Sources
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■ TORUS ® UHV Circular
We offer a comprehensive line of circular TORUS ® magnetron sputter
sources, in 2" and 3" diameters, suited for ultra high vacuum R&D
applications.
These sputter sources are “True UHV” cathodes, able to reach base
pressures below 10-10 Torr due to their all-welded construction and 350°
C bakeout temperature.
Their unique high-strength rare earth magnet arrays can be
adjusted without breaking vacuum, enabling the user to optimize
the sputtering profile.
Additionally, these sputter sources are available with an integral gas
injection port for introducing the process gas directly to the target.
NOTE: See www.lesker.com for current information and models
of Torus Sources.
• Versatile RF, DC, and Pulsed-DC operation
• True UHV all-welded design (no elastomeric seals)
• Excellent film uniformity (±3%) and target utilization (up to 30%)
• Integral gas injection port to introduce process gas at the
target's surface
• Optional deposition chimneys and flip-style shutters reduce
contamination during co-deposition
• High-strength rare earth magnet arrays for sputtering magnetic
and non-magnetic materials available for 3" UHV source
• Magnet array is isolated from cooling water and can be removed
without breaking vacuum
• Standard—Type-N (male) power connectors, indirect water
cooling, and balanced magnetic operation
• Unbalanced operation is available (please contact us at
ped@lesker.com for more information)
• Cathode bakeable to 350° C (with magnet array removed)
TORUS Configuration & Pricing Matrix
Select from the configuration options to create a part number and price
for the particular TORUS sputter source required.
Example Configuration: TM3US046GF is a 3" O.D. source mounted
on a 4" body (measured from flange to target surface) with a standard
magnet array mounted to a 6" CF flange with gas injection and pneumatic
flip-style shutter. Example configuration options selected shown in red
below.
Part No. Prefix Base Price
TORUS Model/Size
For 2" O.D. Targets (0.060"–0.25") TM2U Call
For 3" O.D. Targets (0.060"–0.25") TM3U Call
Option Part No. Additional Price
Magnet Array
Standard S N/C
Magnetic Materials (Not avail. for TM2U) M Call
Insertion Length *
4" 04 N/C
9.25" 09 N/C
Flange Size **
6" CF Flange 6 N/C
Gas Injection
Gas Injection Ring G Call
Gas Injection Ring and Chimney B Call
Shutter
Pneumatic Actuation Flip-Style F Call
Pneumatic Actuation Swing-Style S Call
(none) X N/C
*Custom insertion lengths available.
**Other flange sizes available.
NOTE: Contact our Process Equipment Division at ped@lesker.com to discuss
your specific vacuum application and process equipment needs.
Applicable Source Part No. Base Price
300W RF Package, 220 VAC TM2U, TM3U RF03A22XX300 Call
600W RF Package, 220 VAC TM2U, TM3U RF06A22XX300 Call
500W DC Package, 115 VAC TM2U, TM3U DC05A12NN Call
500W DC Package, 208 VAC TM2U, TM3U DC05B12NN Call
1.5kW RF Package, 208 VAC TM2U, TM3U DC15B12NU Call
*All RF packages come with interconnect cables and a 3' cable from the tuner.
**All DC packages come with a 12' cable from the power supply.

■ TORUS ® Platforms
Our unique TORUS ® Platform is a complete sputtering package. The
sputter source (cathode), shutter assembly, and integral gas injection
are all combined on a rotatable 8" CF flange (other mounting flanges
available).
The TORUS sputter source is offset from the center by 1.5", allowing
for an eccentric rotation of the cathode. This cathode rotation enables
the user to manipulate the thin film deposition by offsetting the source
from a rotating substrate.
The 8" CF flange is equipped with a VCR ® port for use with the gas
distribution shroud to inject the process gas directly to the sputter
target’s surface.
Through the use of compression fittings, the source-to-substrate
distance is easily adjusted with up to 6" of variability.
TORUS ® Magnetron Sputtering Cathodes
➤ R&D Sources
• Platform packages available for 1" to 4" circular TORUS
sputter sources
• Axial, right angle, or flexible head assemblies
• RF, DC, or Pulsed-DC operation
• Adjustable source-to-substrate distance
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• Pneumatic flip-style or swing-style UHV compatible shutter
assemblies
• Standard 8" rotatable CF flange mount (other mounting
flanges available)
• Integral gas injection port delivers process gas directly
to target surface
Contact our Process Equipment Division at ped@lesker.com to discuss your
specific vacuum application and process equipment needs.
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TORUS ® Magnetron Sputtering Cathodes
➤ R&D Sources
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Deposition Sources
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■ TORUS ® Clusters
Co-deposition of materials is an important adjunct to thin film materials
research and production. Clusters of multiple TORUS ® sputter sources
(cathodes) mounted on a single flange are ideal for these applications.
TORUS cluster sources are available with optional cross-contamination
shields, integral target gas injection ports, individual source shutters,
and a variety of flange mounting options.
For applications requiring simultaneous depositions on large substrates,
provisions should be made to the deposition system for substrate rotation to
ensure uniform film thickness and alloy composition, or during non-rotating
depositions a planned compositional gradient can be created.
NOTE: LTE and HTE Clusters sources are also available. Please contact us
for more information.
B
H
A
D
C
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F
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How To Order a TORUS ® Cluster Source
Our extensive systems manufacturing and applications integration
expertise enables us to optimize virtually any deposition process.
Please follow the drawing guidelines when customizing your TORUS ®
Cluster source.
Description Dimension
Distance from Cluster Flange to Substrate A
Source Specifications and Quantity B
Throw Distance C
Angle D
Offset Distance E
Source Offset Distance from Center F
Substrate Size G
Flange Size and Type H
Please email specifications to our Process Equipment Division at ped@lesker.com or call us at 1-800-245-1656 to discuss your specific process
needs. For the TORUS ® Cluster Source configuration tool please see www.lesker.com to start your process.

These sputter sources feature a unique combination of exceptional
target life, high sputter rates, and increased power densities
unmatched in the industry. The patented magnet designs trap
electrons in inner, center, and outer erosion zones with precise
magnetic field shapes to enable even erosion at maximum
sputter target usage.
With circular production sources available from 6" to 12"
diameter and linear sources available in lengths up to 140",
KJLC ® is positioned to offer the sputter solution for your
production environment.
TORUS ® Magnetron Sputtering Cathodes
➤ Production Sputtering Sources
Our TORUS ® line of performance production magnetron sputter sources is a major
breakthrough in the field of high-volume sputtering with target utilization up to 50%.
• Target utilization up to 50%
• Operating voltage drops as low as 15% for deposition
process stability
• Patented magnet designs for magnetic or nonmagnetic materials
• Standard linear cathode sizes from 2" to 11" wide
and up to 140" long
• Standard circular cathode sizes up to 12" diameter
• Versatile RF, DC, or Pulsed-DC operation
• Internal or flange-mount configurations
• Customer-specific designs available
• Cathode retrofit and rebuild services available
Contact our Process Equipment Division at ped@lesker.com to discuss your
specific vacuum application and process equipment needs.
Applications:
• Automotive coatings
• Architectural glass
• Photovoltaic cells
• Superconductors
• Tool coatings
• Wear coatings
• Flat panel displays
• Lighting
• OLED/PLEDs
• Medical coatings
• Optical coatings
Utilization by Target Size
Our production cathodes optimize sputter target utilization for a wide
range of target sizes, geometries, and materials. The values represented
in the utilization table were from using aluminum targets eroded at 9kW and
10 -3 Torr using argon.
Target Size (in.)
Utilization by Weight
(no backing plate) kW Hr.
Volume Used
(in
Groove
3 ) Depth
Linear Cathode Production Sources
2 x 38 x 1 /4 0.28 181 5.1 0.183"
31 /2 x 30 x 3 /8 0.4 558 15.7 0.25"
5 x 12 x 1 /2 0.38 371 12 0.45"
5 x 12 x 5 /8 0.33 409 15 0.525"
5 x 36 x 1 /2 0.37 975 36 0.461"
6 x 15 x 5 /8 0.41 793 23 0.575"
6 x 46 x 5 /8 0.4 2170 69 0.583"
8 x 36 x 7 /8 0.44 3361 111 0.763"
11 x 45 x 1 0.43 5869 173 0.81"
Circular Cathode Production Sources
6 x 1 /2 0.37 146 5.5 0.45"
7 x 5 /8 0.41 346 10 0.555"
7 x 3 /4 0.41 410 11.8 0.62"
8 x 3 /4 0.38 495 14.1 0.583"
8 x 7 /8 0.41 719 18 0.726"
8 x 1 0.42 870 20.2 0.82"
12 x 7 /8 0.45 1576 44.5 0.79"
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TORUS ® Magnetron Sputtering Cathodes
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➤ Performance Production Sources
■ TORUS 10 CA Performance Production Cathodes
The KJLC ® TORUS ® 10 CA (center anode) production sputtering cathodes are designed specifically
for applications using masks that are best attached directly to the sputter source. (ie. CD and
DVD metallization)
The CD industry has long realized the benefits of our unique design, which features:
• Production style, high volume sputter source
• 6.37" diameter target with center anode design
• 6" round center anode design
• Dual race track designs
• High target material utilization
• High power versions available
• Isolated magnet assemblies
• A variety of mounting configurations
• RF, DC, or Pulsed-DC operation
Target Diameter — 63 /8"
Target Thickness — 5 /8"
RF, DC, Pulsed-DC — Yes
Power Density — >500W/in2 SPECIFICATIONS
Direct Cooled Target — No
Indirect Cooled Target — Yes
Magnet Cooling — Indirect
Axial Mount (1.5" O.D. tube) — No
Flange Mount — Yes
Contact ped@lesker.com for more information on our
patent-pending TORUS 10 CA sputter cathodes.
➤ Services
We design, manufacture, and service all of our TORUS ® sputter sources. Our in-house experts
have decades of combined magnetron cathode applications and service experience.
Magnetron Cathode Retrofits:
We can produce retrofit magnetron designs for many obsolete sputter
source cathode designs. Perkin Elmer and Varian sputtering systems,
among others, are serviced and retrofitted in our dedicated cathode
assembly clean area at our Pittsburgh, Pennsylvania, U.S. facility.
Magnetron Cathode Rebuild Service:
We offer a complete rebuild service for our popular TORUS brand and
other magnetron cathodes in both circular and linear configurations.
We can supply retrofit assemblies, service and replace worn parts,
or provide a complete rebuild based on your specifications.
NOTE: Contact our cathode service technicians at cathodeservice@lesker.com to
discuss your specific cathode service and retrofit needs.