XIX Sympozjum Srodowiskowe PTZE - materialy.pdf
XIX Sympozjum Srodowiskowe PTZE - materialy.pdf XIX Sympozjum Srodowiskowe PTZE - materialy.pdf
2.2 IF-MFs exposure devices XIX Sympozjum PTZE, Worliny 2009 Two exposure systems used in this study. An IF-MFs exposure device (Fig. 1), which has a resin CO2 incubator (inside dimension of 200mm x 200mm x 200mm, water-jacket for temperature control) mounted over a plain coil (diameter of 160mm) was used. Plain coil was driven by bi-polar amplifier (BP4620, NF block, Japan). Sinusoidal IF-MFs were generated using this device and maximum density of magnetic field within exposure area was up to 0.8 mT at 2 kHz, 10 kHz and 20 kHz, respectively. Another exposure system was to generate 0.91 mT rms at 2 kHz, 1.1 mT rms at 20 kHz, respectively [1]. 2.3 Experimental procedure For Ames test, cultured bacterial cells were poured on minimal glucose agar plates with a trace of histidine and biotin. These test plates divided into two groups and one group was incubated under IF-MF (2 and 20 kHz) Fig. 1 IF-MFs exposure device and the other group was incubated without IF-MF as control. After 48 hours, revertant colonies were scored. For MLA, cells were inoculated in a T-25 flask filled with 5 ml of RPMI1640 medium with 10% horse serum (2.5x10 5 cells/ml) and were exposed to a IF-MF (2, 10 and 20 kHz) for 48 hr in 5% CO2 at 37 o C with single dilution after 24 hr. Unexposed control cells were incubated in a conventional incubator. After exposure period, plate efficiency and frequency of TFT resistant cells as tk -/- mutant was determined. For in vitro micronucleous test, The Chinese hamster V79 cells were exposed to a IF-MF (2, 10 and 20 kHz) for 24h in 35mm Petri dishes. After the exposure, cells were treated with cytochalasin B. Then cells were fixed 24h later after the cytochalasin B treatment. The ratios of micronucleus formation rates were estimated by counting micronucleus in approximately 1,000 binucleous cells. 3. Results and Discussion In Ames test, no statistically significant difference in mutation frequency was observed between exposed and control groups in both TA98 and TA100 strain. In the MLA, the plate efficiency that is representative index of acute toxicity was not affected by exposure to all IF-MFs conditions. In addition, the mutation frequency at tk allele (tk +/- to tk -/- ) is almost same between an IF-MF exposed and unexposed cells in all IF-MFs exposure conditions. Fig. 2 shows mutation frequency by exposure to 62 Mutation Frequency (×10-6 Mutation Frequency (×10 cells) -6 cells) C ontrol Exposure MMS 1000 900 800 700 * 600 500 400 300 200 100 0 Treatm ent Fig. 2 Mutation frequency by exposure to 0.8 mT, 20 kHz IF MF.
XIX Sympozjum PTZE, Worliny 2009 0.8 mT, 20 kHz IF-MF, respectively as typical results. All of other condition also did not show any difference between control and exposure (Data not shown). In in vitro micronucleus test, neither significant nor reproducible difference between MF exposed and unexposed control cells was found in the micronucleus formation rates in 2 kHz, 0.8 mT IF-MF and also 20 kHz, 0,8 mT IF-MF(Fig. 3), respectively. These results suggest that exposure to 2 kHz, 10 kHz and 20 kHz, up to 1 mT sinusoidal IF-MFs did not induced gene mutations, larger scale chromosomal changes, recombination, aneuploidy and others that could be detected by genotoxicity test systems in this study. Thus, our results suggest that sinusoidal IF-MFs (2, 10 and 20 kHz) did not have mutagenic potential even in the MF strenghth was exceeded 100 times of the reference level in general public exposure of ICNIRP guideline. 4. Conclusion Experimental results suggest that exposure to 2, 10 and 20 kHz, up to 1 mT sinusoidal IF-MFs did not have any potential to induce genetic damages that could be detected by Ames assay, MLA and in vitro micronucleus test. References Micronucleus form ation /1000 cells) 100 90 80 70 60 50 40 30 20 10 0 [1] NAKASONO S, et al., “Intermediate frequency magnetic fields do not have mutagenic, co-mutagenic or gene conversion potentials in microbial genotoxicity tests”, Mut. Res. (2008) Vol. 649, 187-200. 63 * Treatm ent Fig. 3 Result of micronucleus formation in 20 kHz, 0.8 mT magnetic field * C ontrol Exposure C ontrol (MMC) Exposure (M M C) *; p
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<strong>XIX</strong> <strong>Sympozjum</strong> <strong>PTZE</strong>, Worliny 2009<br />
0.8 mT, 20 kHz IF-MF, respectively as typical results. All of other condition also did not<br />
show any difference between control and exposure (Data not shown).<br />
In in vitro micronucleus test, neither<br />
significant nor reproducible difference<br />
between MF exposed and unexposed<br />
control cells was found in the<br />
micronucleus formation rates in 2 kHz,<br />
0.8 mT IF-MF and also 20 kHz,<br />
0,8 mT IF-MF(Fig. 3), respectively.<br />
These results suggest that exposure to<br />
2 kHz, 10 kHz and 20 kHz, up to<br />
1 mT sinusoidal IF-MFs did not<br />
induced gene mutations, larger scale<br />
chromosomal changes, recombination, aneuploidy and others that could be detected by<br />
genotoxicity test systems in this study. Thus, our results suggest that sinusoidal IF-MFs (2, 10<br />
and 20 kHz) did not have mutagenic potential even in the MF strenghth was exceeded<br />
100 times of the reference level in general public exposure of ICNIRP guideline.<br />
4. Conclusion<br />
Experimental results suggest that exposure to 2, 10 and 20 kHz, up to 1 mT sinusoidal IF-MFs<br />
did not have any potential to induce genetic damages that could be detected by Ames assay,<br />
MLA and in vitro micronucleus test.<br />
References<br />
Micronucleus form ation /1000 cells)<br />
100<br />
90<br />
80<br />
70<br />
60<br />
50<br />
40<br />
30<br />
20<br />
10<br />
0<br />
[1] NAKASONO S, et al., “Intermediate frequency magnetic fields do not have mutagenic,<br />
co-mutagenic or gene conversion potentials in microbial genotoxicity tests”, Mut. Res.<br />
(2008) Vol. 649, 187-200.<br />
63<br />
*<br />
Treatm ent<br />
Fig. 3 Result of micronucleus formation in 20 kHz,<br />
0.8 mT magnetic field<br />
*<br />
C ontrol<br />
Exposure<br />
C ontrol (MMC)<br />
Exposure (M M C)<br />
*; p