Derwent World Patents Index (DWPI) - EPI ... - Thomson Reuters
Derwent World Patents Index (DWPI) - EPI ... - Thomson Reuters
Derwent World Patents Index (DWPI) - EPI ... - Thomson Reuters
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electroerosive S06-J<br />
electrographic S06-J<br />
electrophotographic S06-E<br />
electrosensitive S06-J<br />
external control of S06-K07C1<br />
paper feeding S06-K03A<br />
preventing illegal printing S06-K07A3<br />
impact S06-F<br />
ink, for ink-jet S06-G04<br />
ink-jet S06-G<br />
interface S06-K07C2<br />
laser S06-E<br />
layout control S06-K03A<br />
magnetic S06-K<br />
monitoring S06-K07B<br />
needle impact S06-F01<br />
optical S06-E<br />
photosensitive paper S06-E01<br />
print job S06-K07C1A<br />
print queue S06-K07C1A<br />
ribbon, for impact type S06-F03<br />
sheet feeding S06-K02<br />
thermal S06-H<br />
thermal ink composition S06-H02A<br />
thermal ink-jet S06-G01<br />
thermal printhead S06-H03<br />
thermal ribbon S06-H02<br />
thermal transfer S06-H02<br />
thin-film heads for U14-H01B<br />
typewriter, self contained S06-K99A<br />
using thermal paper S06-H01<br />
using type S06-F02<br />
wire dot impact S06-F01<br />
Printing<br />
colour separation S06-C02B<br />
computer - see Printer, computer S06-K99C<br />
computer-to-plate S06-C02A1<br />
digital photography W04-D10<br />
W04-M01B1<br />
electrophotographic - see<br />
Electrophotography S06-K99B<br />
facsimile - see Facsimile S06-K99D<br />
photoelectronic composing S06-C01<br />
photographic - see Photography S06-B04A<br />
plate production S06-C02A<br />
textile printing X25-T04D<br />
ticket, receipt T05-C01<br />
Printing press S06-C<br />
collator, collector, folder S06-C09<br />
composing S06-C01<br />
control S06-C03A<br />
plate production S06-C02A<br />
Prisms<br />
generating spectrum S03-A02A<br />
testing S02-J04A9<br />
Probe<br />
bed-of-nails type V04-R06G1A<br />
board S01-H03A<br />
contact type V04-R06G1<br />
flying V04-R06G1B<br />
generic V04-R06G1C<br />
inductive V02-G01E<br />
MEMS type V04-R06G5<br />
multiple-probe arrangement S01-H03A<br />
non-contact type V04-R06G2<br />
single S01-H03B<br />
<strong>EPI</strong> Manual Codes 2011 1121<br />
Part 3<br />
ultrasonic S03-E08X<br />
Probe cards V04-Q08<br />
probe cards, horizontal V04-Q08A<br />
probe cards, vertical V04-Q08B<br />
semiconductor device testing U11-F01C1<br />
semiconductor wafer testing U11-F01D1<br />
Process control T06-A<br />
application T06-D<br />
Process monitoring, production line T05-G02B<br />
Processing<br />
data transmission W01-A07F<br />
electromagnetic prospecting data S03-C02X<br />
particle movement S03-G01A<br />
seismic data S03-C01X<br />
Processing, audio signals (general) W04-G<br />
compression and expansion W04-G04<br />
improving S/N ratio W04-G03A<br />
noise reduction W04-G03<br />
reducing acoustic feedback W04-G03C<br />
Processing, image - see Image processing<br />
Processing, video signals W04-P<br />
Processing device<br />
characterised by beam type V05-F05A7<br />
complete device V05-F05E1<br />
device details V05-F05E3<br />
for surface treatment V05-F08D5<br />
novel details V05-F05E<br />
using beams V05-F05A<br />
using electron beam V05-F05A7A<br />
using ion beam V05-F05A7C<br />
with flood effect beam V05-F05A5<br />
with focused beam V05-F05A1<br />
Processing tube V05-F05<br />
beam masking element V05-F04X<br />
beam tube V05-F05A<br />
characterised by beam type V05-F05A7<br />
charge-up prevention element V05-F04X<br />
circuitry V05-F05E5<br />
cleaning, maintenance V05-F05E9<br />
cooling V05-F04K<br />
electron beam tube V05-F05A7A<br />
electron cyclotron resonance (ECR) tube<br />
V05-F05C3<br />
equipment function - see Processing tube<br />
function V05-F08<br />
externally applied ionising energy V05-F05C1<br />
flood effect beam tube V05-F05A5<br />
focused beam tube V05-F05A1<br />
heating arrangement V05-F04X<br />
ion beam tube V05-F05A7C<br />
magnetron effect V05-F05C3A<br />
microwave excitation of plasma V05-F05C1A<br />
monitoring V05-F05E5A<br />
multiple beam tube V05-F05A3<br />
operation of device V05-F05E5<br />
optical excitation of plasma V05-F05C1C<br />
plasma V05-F05C<br />
plasma confinement/manipulation V05-F05C3<br />
plasma, capacitively coupled V05-F05C1G<br />
plasma, inductively coupled V05-F05C1E<br />
power supplies V05-F05E5<br />
RF feed arrangement V05-F04X<br />
specimen holder V05-F04G<br />
tunnelling effect tube V05-F05D<br />
UV source V05-F04X
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