Newsletter_07-2024_EN

More documents

Recommendations

Info

Opening of the joint ASML-imec High NA EUV Lithography Lab marks a milestone in preparing High NA EUV lithography for accelerated adoption in mass manufacturing ASML and imec open joint High NA EUV Lithography Lab offering an early development platform to the leading-edge semiconductor ecosystem The TWINSCAN EXE:5000 High NA EUV scanner in the High NA Lab demonstrating the first-ever 10 nm dense lines obtained in a single exposure. Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML Holding N.V. (ASML), a leading lithography supplier to the semiconductor industry, today announced the opening of the High NA EUV Lithography Lab in Veldhoven, the Netherlands, a lab jointly run by ASML and imec. After a build and integration period of years, the Lab is ready to provide leading-edge logic and memory chip makers, as well as advanced materials and equipment suppliers access to the first prototype High NA EUV scanner (TWINSCAN EXE:5000) and surrounding processing and metrology tools. The opening of the joint ASML-imec High NA EUV Lab represents a milestone in preparing High NA EUV for high-volume manufacturing – anticipated to happen in the 2025–2026 timeframe. By giving leading-edge logic and memory chip manufacturers access to the High NA EUV prototype scanner and surrounding tools (which include a coat and development track, metrology tools, wafer and mask handling systems), imec and ASML support them in de-risking the technology and develop private High NA EUV use cases before the scanners will be operational in their production fabs. Access will also be provided to the broader ecosystem of material and equipment suppliers and to imec’s High NA patterning program. Readying the 0.55 NA EUV scanner and infrastructure followed intense preparations that started in 2018. In this time span, ASML and ZEISS were able to develop High NA EUV scanner specific solutions related to the source, optics, lens anamorphicity, stitching, reduced depth of focus, edge placement errors and overlay accuracy. Meanwhile, imec, in tight collaboration with its extended supplier network, prepared the patterning ecosystem, including the development of advanced resist and underlayer materials, photomasks, metrology and inspection techniques, (anamorphic) imaging strategies, optical proximity correction (OPC), and integrated patterning and etch techniques. The preparatory work recently resulted in first exposures, showing for the first time ever 10 nm dense lines (20 nm pitch) printed in Veldhoven on metal oxide resists (MORs) using the 0.55 NA EUV prototype scanner. Imec’s president and CEO Luc Van den hove: “High NA EUV is the next milestone in optical lithography, promising the patterning of metal lines/spaces with 20 nm pitch in one single exposure and enabling next generations of DRAM chips. This will improve yield and reduce cycle time and even CO2 emissions compared to existing multi-patterning 0.33 NA EUV schemes. It will therefore be a key enabler to push Moore’s Law well into the ångström era. We are now thrilled to explore these capabilities in real life, using the prototype High NA EUV scanner. For imec and its partners, the High NA EUV Lithography Lab will act as a virtual extension of our 300 mm cleanroom in Leuven, enabling us to further improve the patterning ecosystem and push the resolution of the High NA EUV towards its ultimate limits.” ASML’s President and CEO Christophe Fouquet: “The ASML-imec High NA EUV Lithography Lab provides an opportunity for our EUV customers, partners and suppliers to access the High NA EUV system for process development while waiting for their own system to be available at their factories.. This type of very early engagement with the ecosystem is unique and could significantly accelerate the learning curve on the technology and smoothen the introduction in manufacturing. We are committed to work with and support our customers in this journey with High NA EUV.” IMEC Belgium BL 3001 Leuven www.reinraum.de | www.cleanroom-online.com NEWSLETTER | Edition EN 07-2024 page 14/28
National study requires new peel apart packs to assess relationship between microbiological quality of operating theatre air and infection rate Cherwell develops bespoke new product to support air quality audit in UCA operating theatres Cherwell, cleanroom microbiology solutions expert, has developed a new peel apart pack settle plate product to support a UK national study investigating the relationship between microbiological quality of operating theatre air and infection rate. Supported by NHS England, the UK Health Security Agency and British Orthopaedic Association, the JOINTCASE audit aims to check the air quality of ultra clean air (UCA) operating theatres while actually in use for surgery. Despite the well-documented relationship between microbiological air quality and deep infection rates, it is not routine to monitor operating theatres when in use. This is because slit samplers are traditionally used to test air quality by volumetric counting, but these are labour-intensive, requiring trained individuals and not practical for routine audits. The study management group noted settle plate counting to be a simpler methodology and its relationship with volumetric counting well established. Conducted jointly by local orthopaedic and microbiology/infectious disease departments in elective orthopaedic units nationwide, the audit now uses a settle plate based technique. For this, packs of 10 microbiology plates, which can be simply peeled apart aseptically for easy sterile dispensing onto surgical instrument trolleys and next to the wound, were specially developed by Cherwell. To further minimise contamination risk, during transfer for incubation after exposure, the plates can be secured with sterile elastic bands which are also supplied within the packs. The new peel apart packs were required as settle plates are generally packed double or triple wrapped and sterilised for laboratory or cleanroom use, which is not sufficient during surgery in an operating theatre. Study lead and orthopaedic surgeon, Mr. Andrew Thomas, The Royal Orthopaedic Hospital, Birmingham, explained, “Regular plate packs must be opened in a completely New peel apart settle plate pack developed by Cherwell to support UK national study on relationship between microbiological air quality of operating theatres and infection rates. aseptic way using sterile scissors, and that is an additional task for the scrub person. It distracts them and there is a risk of de-sterilising the outside of the settle plates.” “The logical answer was to have a peel apart pack, which can be dispensed onto the sterile instrument trolley, just like any other piece of equipment that is dispensed to the scrub nurse by the circulating staff, but this wasn’t available on the market,” continued Andrew. Cherwell’s Bespoke Product team supported Andrew and the JOINTCASE audit through the company’s New Product Request Process. Andrew said, “We approached Cherwell who took a keen interest in our problem and worked hard to deliver the solution. Other well-known multinational companies working in the area were simply not interested in a relatively small problem. Cherwell’s team, recognised that making the peel apart packs would be a great contribution, and actually not terribly difficult to deliver.” The Joint Orthopaedics and Infectious diseases National Theatre Clean Air Services Evaluation (JOINTCASE) is an ongoing national, multicentre, prospective audit. All elective orthopaedic units in the UK are encouraged to participate in this study. This includes major elective centres, tertiary units, and district general hospitals. Initially, the audit will focus on UCA theatres used for joint replacement surgery in the UK. In addition to its standard range of Redipor® media products, instrument accessories and packaging, Cherwell also offers a fully bespoke service for any aspect of environmental monitoring programs. Cherwell’s new peel apart packs of Redipor® tryptone soy agar (TSA) settle plates, developed initially as a bespoke product for the JOINTCA- SE study, are now available for purchase as packs of 10. Cherwell Laboratories Ltd OX26 4XB BICESTER Vereinigtes Königreich www.reinraum.de | www.cleanroom-online.com NEWSLETTER | Edition EN 07-2024 page 15/28
Page 1 and 2: EN 07/24 Receiving ISO 3 cleanroom
Page 3 and 4: Quantum sensor improves process and
Page 5 and 6: natively a mop with a ready prepare
Page 7 and 8: Unique look behind the scenes of AT
Page 9 and 10: industry forward and at the same ti
Page 11 and 12: „Smart power technologies“ in a
Page 13: provider of measurement instruments
Page 17 and 18: tion coefficient of < 1% in the ran
Page 19 and 20: Acquisition will advance Merck’s
Page 21 and 22: Viola Schäfer, Pfeiffer Vacuum Mar
Page 23 and 24: Exhibition Grounds (Copyright: DECH
Page 25 and 26: The MEDICA START-UP COMPETITION tro
Page 27 and 28: GEMÜ butterfly valves in the GEMÜ

Newsletter_07-2024_EN

Create successful ePaper yourself

Delete template?

Save as template?