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Chemistry and Lithography
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Chemistry and Lithography
BOOK DETAIL
Hardcover: 892 pages Publisher: SPIE Press; 1 edition (March 8, 2011) Language: English ISBN-10:
1118030028 ISBN-13: 978-1118030028 Product Dimensions: 7.2 x 2.1 x 10.3 inches Shipping Weight: 4.2
pounds (View shipping rates and policies) Customer Reviews: 4.0 out of 5 stars1 customer rating
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Book Description
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in
lithography in a manner that is accessible to a wide readership. The book presents topics on the
optical and charged particle physics practiced in lithography, with a broader view of how the
marriage between chemistry and optics has made possible the print and electronic revolutions of
the digital age. The related aspects of lithography are thematically presented to convey a unified
view of the developments in the field over time, from the very first recorded reflections on the
nature of matter to the latest developments at the frontiers of lithography science and technology.
Part I presents several important chemical and physical principles involved in the invention and
evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and
handling of lithographic chemicals and materials. Part III investigates several important chemical
and physical principles involved in the practice of lithography. Chemistry and Lithography is a
useful reference for anyone working in the semiconductor industry.

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