European Patent Bulletin 2012/09 - European Patent Office
European Patent Bulletin 2012/09 - European Patent Office European Patent Bulletin 2012/09 - European Patent Office
(H01H) II.1(1) (72) Bruchmann, Klaus, 96450 Coburg, DE (74) Appelt, Christian W., Forrester & Boehmert Pettenkoferstrasse 20-22, 80336 München, DE H01H 13/02 → (51) H01H 13/83 H01H 13/64 → (51) H01H 9/00 (51) H01H 13/83 (11) 2 251 882 B1 H01H 13/02 (25) Ja (26) En (21) 08872408.3 (22) 15.08.2008 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR (43) 17.11.2010 (86) JP 2008/064626 15.08.2008 (87) WO 2009/101719 2009/34 20.08.2009 (30) 12.02.2008 JP 2008030642 (54) BETRIEBSVORRICHTUNG MIT BELEUCH- TUNGSFUNKTION OPERATING DEVICE WITH ILLUMI- NATION FUNCTION DISPOSITIF OPÉRATIONNEL AVEC FONC- TION D'ÉCLAIRAGE (73) Sumitomo Wiring Systems, Ltd., 1-14, Nishisuehirocho, Yokkaichi-shi Mie 510- 8503, JP (72) YAMAMOTO, Hironobu, Yokkaichi-shi Mie 510-8503, JP (74) Uchida, Kenji, SA Fedit-Loriot 38, avenue Hoche, 75008 Paris, FR (51) H01H 33/26 (11) 2 218 085 B1 G01R 31/12 (25) Fr (26) Fr (21) 08855979.4 (22) 01.12.2008 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR (43) 18.08.2010 (86) EP 2008/066552 01.12.2008 (87) WO 2009/071516 2009/24 11.06.2009 (30) 03.12.2007 FR 0759511 (54) VORRICHTUNG ZUR ERKENNUNG UND ORTUNG ELEKTRISCHER LADUNGEN BEI EINEM FLÜSSIGKEITSISOLIERTEN ELEK- TRISCHEN GERÄT DEVICE FOR DETECTING AND LOCATING ELECTRICAL DISCHARGES IN A FLUID- INSULATED ELECTRICAL APPARATUS DISPOSITIF DE DETECTION ET DE LOCA- LISATION DE DECHARGES ELECTRIQUES DANS UN EQUIPEMENT ELECTRIQUE A ISOLATION PAR FLUIDE (73) AREVA T&D SAS, Tour Areva 1, place Jean Millier, 92084 Paris La Défense Cedex, FR (72) GRIESHABER, Wolfgang, F-69006 Lyon, FR FANGET, Alain, 01390 Tramoyes, FR (74) Ilgart, Jean-Christophe, BREVALEX 95 rue d'Amsterdam, 75378 Paris Cedex 8, FR (51) H01H 33/664 (11) 2 261 940 B1 (25) Fr (26) Fr (21) 10165178.4 (22) 08.06.2010 (84) AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR (43) 15.12.2010 (30) 10.06.2009 FR 0953855 (54) Wickung für einen Vakuumschalterkontakt mit erhöhter Festigkeit, Vakuumschalter und Schalteinrichtung, insbesondere Generator-Schutzschalter Coil for a contact of a vacuum switch having an increased mechanical endurance, and related vacuum switch and switchgear, in particular alternator load-break switch Europäisches Patentblatt European Patent Bulletin Bulletin européen des brevets Enroulement pour contact d'ampoule a vide a moyenne tension a endurance amelioree, ampoule a vide et disjoncteur, tel qu'un disjoncteur sectionneur d'alternateur associes (73) Schneider Electric Energy France, 35 rue Joseph Monier, 92500 Rueil Malmaison, FR (72) Kantas, Saïd, 34920 Le Cres, FR Berthon, Bruno, 34130 Saint-Aunes, FR Triaire, Cédric, 34380 Saint Martin De Londres, FR (74) Ilgart, Jean-Christophe, et al, BREVALEX 95 rue d'Amsterdam, 75378 Paris Cedex 8, FR (51) H01H 35/02 (11) 1 939 911 B1 G01C 9/10 H01H 35/14 (25) Ja (26) En (21) 06796998.0 (22) 17.08.2006 (84) DE FR GB (43) 02.07.2008 (86) JP 2006/317021 17.08.2006 (87) WO 2007/021039 2007/08 22.02.2007 (30) 17.08.2005 JP 2005265998 (54) KOMPAKTER GENEIGTER VIBRATIONS- SENSOR UND VERFAHREN ZU SEINER HERSTELLUNG COMPACT TILTED VIBRATION SENSOR AND METHOD OF MANUFACTURING THE SAME CAPTEUR DE VIBRATION INCLINÉ COMPACT ET SON PROCÉDÉ DE FABRI- CATION (73) G-Device Corporation, 1-5-6-501 Nerima, Nerima-ku, Tokyo 176-0001, JP (72) SHIMASE, Teruo, Tokyo 176-0001, JP (74) Radünz, Ingo, Patentanwalt Dipl.-Ing. Ingo Radünz Schumannstrasse 100, D-40237 Düsseldorf, DE H01H 35/14 → (51) H01H 35/02 (51) H01H 37/32 (11) 1 983 539 B1 B29C 57/10 (25) De (26) De (21) 08006859.6 (22) 04.04.2008 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR (43) 22.10.2008 (30) 16.04.2007 DE 102007018206 (54) Temperaturbegrenzer und Verfahren zu seiner Herstellung Temperature limiter and method for its manufacture Limiteur de température et procédé pour le fabriquer (73) TMC Sensortechnik GmbH, Westliche Gewerbestr. 3, 75015 BRETTEN-Gölshausen, DE (72) Radbruch, Jens, 75245 Neulingen, DE (74) Mommer, Niels, Twelmeier Mommer & Partner Westliche 56-68, 75172 Pforzheim, DE H01H 85/153 → (51) C08L 77/00 (51) H01H 85/20 (11) 1 842 217 B1 (25) En (26) En (21) 05855509.5 (22) 23.12.2005 (84) DE FR (43) 10.10.2007 (86) US 2005/046962 23.12.2005 (87) WO 2006/081028 2006/31 03.08.2006 (30) 27.01.2005 US 44796 (54) SCHALTBARER STROMVERTEILUNGS- BLOCK MIT SICHERUNG SWITCHABLE FUSED POWER DISTRI- BUTION BLOCK BLOC DE DISTRIBUTION D'ENERGIE COMMUTABLE A FUSIBLE INCORPORE 726 Patente Patents Brevets (09/2012) 29.02.2012 (73) Cooper Technologies Company, 600 Travis Street Suite 5800, Houston, TX 77002, US (72) KORCZYNISKI, Jacek, Michael, Niles, Illinois 60714, US (74) Smee, Anthony James Michael, et al, Gill Jennings & Every LLP The Broadgate Tower 20 Primrose Street, London EC2A 2ES, GB (51) H01J 5/60 (11) 2 034 508 B1 F16B 21/18 (25) Ru (26) De (21) 06757971.4 (22) 26.05.2006 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR (43) 11.03.2009 (86) RU 2006/000271 26.05.2006 (87) WO 2007/139419 2007/49 06.12.2007 (54) LAMPE MIT DREHBARER BIRNE UND LICHTQUELLE LAMP WITH A ROTATABLE LIGHT BULB AND A LIGHT SOURCE LAMPE DOTÉE D'UNE AMPOULE ROTA- TIVE ET D'UNE SOURCE LUMINEUSE (73) Tsay, Victor Ivanovich, Proezd Karamzina, 1- 1-485, Moscow, 117463, RU (72) Tsay, Victor Ivanovich, Moscow, 117463, RU (74) Jeck, Anton, Jeck - Fleck - Herrmann Patentanwälte Klingengasse 2/1, 71665 Vaihingen/Enz, DE (51) H01J 17/49 (11) 1 950 787 B1 (25) En (26) En (21) 08100826.0 (22) 23.01.2008 (84) DE FR GB (43) 30.07.2008 (30) 25.01.2007 KR 20070007974 (54) Plasmaanzeigetafel und Verfahren zu ihrer Herstellung Plasma Display Panel and Manufacturing Method thereof Panneau d'affichage à plasma et son procédé de fabrication (73) Samsung SDI Co., Ltd., 673-7, Maetan-dong Yeongtong-gu Suwon-si, Gyeonggi-do, KR (84) DE FR GB (72) Kim, Jeffrey, Suwon-si, Gyeonggi-do, KR (74) Walaski, Jan Filip, et al, Venner Shipley LLP 200 Aldersgate, London EC1A 4HD, GB H01J 17/49 → (51) G09G 3/28 (51) H01J 35/14 (11) 2 160 750 B1 (25) En (26) En (21) 08763358.2 (22) 17.06.2008 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR (43) 10.03.2010 (86) IB 2008/052377 17.06.2008 (87) WO 2008/155715 2008/52 24.12.2008 (30) 21.06.2007 EP 07110781 (54) SCHNELLE DOSISMODULIERUNG ÜBER Z-DEFLEKTION IN EINER ROTIERENDEN ANODE ODER EINER ROTIERENDEN RAHMENRÖHRE FAST DOSE MODULATION USING Z- DEFLECTION IN A ROTATING ANODE OR ROTATING FRAME TUBE MODULATION DE DOSE RAPIDE À L'AIDE D'UNE DÉVIATION DANS L'AXE DES Z DANS UNE ANODE ROTATIVE OU UN TUBE À CADRE ROTATIF (73) Philips Intellectual Property & Standards GmbH, Lübeckertordamm 5, 20099 Hamburg, DE (84) DE (73) Koninklijke Philips Electronics N.V., Groenewoudseweg 1, 5621 BA Eindhoven, NL
(H01J) II.1(1) (84) AT BE BG CH CY CZ DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR (72) BEHLING, Rolf, K., O., NL-5656 AE Eindhoven, NL (74) Van Velzen, Maaike Mathilde, Philips Intellectual Property & Standards P.O. Box 220, 5600 AE Eindhoven, NL H01J 37/04 → (51) G03F 7/20 (51) H01J 37/147 (11) 1 983 549 B1 H01J 37/317 (25) En (26) En (21) 08154832.3 (22) 18.04.2008 (84) DE FR GB (43) 22.10.2008 (30) 20.04.2007 JP 2007111528 (54) Vorrichtung zur Bearbeitung mit Strahlen Beam Processing Apparatus Appareil de traitement par faisceau (73) SEN Corporation, an SHI and Axcelis Company, 10-1 Yoga 4-chome Setagaya-ku, Tokyo, JP (72) Tsukihara, Mitsukuni, Saijo-shi Ehime, JP Kabasawa, Mitsuaki, Saijo-shi Ehime, JP Matsushita, Hiroshi, Saijo-shi Ehime, JP Yagita, Takanori, Saijo-shi Ehime, JP Amano, Yoshitaka, Saijo-shi Ehime, JP Fujii, Yoshito, Saijo-shi Ehime, JP (74) Gill, David Alan, W.P. Thompson & Co. 55 Drury Lane, London WC2B 5SQ, GB H01J 37/305 → (51) H01L 21/306 H01J 37/317 → (51) G03F 7/20 H01J 37/317 → (51) H01J 37/147 H01J 37/32 → (51) C23C 16/509 (51) H01J 37/34 (11) 2 075 823 B1 H02H 9/02 (25) En (26) En (21) 07025085.7 (22) 24.12.2007 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR (43) 01.07.2009 (54) Stromänderungsbegrenzungsvorrichtung Current change limiting device Dispositif de limitation de changement de courant (73) Huettinger Electronic Sp. z o. o, Marecka St. 47, 05-220 Zielonka, PL (72) Klimczak, Andrzej, 01-633 Warsaw, PL Bugyi, Rafal, 00-264 Warsaw, PL Ozimek, Pawel, 00-712 Warsaw, PL (74) Kohler Schmid Möbus, Patentanwälte Ruppmannstraße 27, 70565 Stuttgart, DE H01J 47/02 → (51) G01T 1/29 (51) H01J 61/02 (11) 2 034 509 B1 H01J 61/34 (25) Ru (26) De (21) 06769538.7 (22) 26.05.2006 (84) AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR (43) 11.03.2009 (86) RU 2006/000272 26.05.2006 (87) WO 2007/139420 2007/49 06.12.2007 (54) GASENTLADUNGS-REFLEKTORLAMPE GAS-DISCHARGE REFLECTOR LAMP LAMPE À DÉCHARGE GAZEUSE À RÉFLECTEUR (73) Tsay, Victor Ivanovich, Proezd Karamzina, 1- 1-485, Moscow, 117463, RU Europäisches Patentblatt European Patent Bulletin Bulletin européen des brevets (72) Tsay, Victor Ivanovich, Moscow, 117463, RU (74) Jeck, Anton, Jeck - Fleck - Herrmann Patentanwälte Klingengasse 2/1, 71665 Vaihingen/Enz, DE H01L 21/00 → (51) G03F 7/023 (51) H01L 21/02 (11) 1 256 977 B1 (25) Ja (26) En (21) 00964741.3 (22) 06.10.2000 (84) DE FR GB NL (43) 13.11.2002 (86) JP 2000/007010 06.10.2000 (87) WO 2002/031871 2002/16 18.04.2002 (54) APPARAT UND METHODE FÜR DIE HER- STELLUNG EINES POLYKRISTALLINEN SILIZIUMFILMS METHOD AND APPARATUS FOR PRODUCING A POLYCRYSTALLINE SILICON FILM PROCEDE ET DISPOSITIF DE PRODUC- TION DE FILM DE SILICIUM POLYCRIS- TALLIN (73) MITSUBISHI DENKI KABUSHIKI KAISHA, 7- 3, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-8310, JP Seiko Epson Corporation, 4-1, Nishishinjuku 2-chome, Shinjuku-ku, Tokyo 163-0811, JP (72) OGAWA, Tetsuya, MITSUBISHI DENKI KABUSHIKI KAISHA, Tokyo 100-8310, JP TOKIOKA, Hidetada, MITSUBISHI DENKI KABUSHIKI K., Tokyo 100-8310, JP NISHIMAE, Junichi, MITSUBISHI DENKI KABUSHIKI K., Tokyo 100-8310, JP OKAMOTO, Tatsuki, MITSUBISHI DENKI KABUSHIKI K., Tokyo 100-8310, JP SATO, Yukio, MITSUBISHI DENKI KABUSHIKI KAISHA, Tokyo 100-8310, JP INOUE, Mitsuo, MITSUBISHI DENKI KABUSHIKI KAISHA, Tokyo 100-8310, JP MIYASAKA, Mitsutoshi, SEIKO EPSON CORPORATION, Suwa-shi, Nagano 392- 8502, JP JIROKU, Hiroaki, SEIKO EPSON CORPORATION, Suwa-shi, Nagano 392- 8502, JP (74) Meissner, Bolte & Partner, Anwaltssozietät GbR Postfach 86 06 24, 81633 München, DE H01L 21/02 → (51) B08B 3/08 (51) H01L 21/20 (11) 1 386 348 B1 H01L 21/308 (25) En (26) En (21) 02750893.6 (22) 07.05.2002 (84) AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR (43) 04.02.2004 (86) EP 2002/005012 07.05.2002 (87) WO 2002/091441 2002/46 14.11.2002 (30) 09.05.2001 US 851730 (54) Herstellungsverfahren einer Halbleiterschicht mit nicht angepasstem Gitter Method of forming a lattice-mismatched semiconductor layer Méthode de formation d'une couche semiconductrice en désaccord de maille (73) Innolume GmbH, Konrad-Adenauer-Allee 11, 44263 Dortmund, DE (72) Ledentsov, Nikolai Nikolaevich, 10717 Berlin, DE (74) Jones, Graham Henry, Graham Jones & Company 77 Beaconsfield Road, Blackheath, London SE3 7LG, GB H01L 21/20 → (51) B08B 3/08 H01L 21/20 → (51) H01L 31/072 727 Patente Patents Brevets (09/2012) 29.02.2012 H01L 21/265 → (51) H01L 31/072 H01L 21/288 → (51) H01L 23/544 (51) H01L 21/306 (11) 1 641 034 B1 H01L 21/3213 H01J 37/305 H01L 21/465 G03F 1/00 (25) En (26) En (21) 05022431.0 (22) 15.04.1998 (84) DE FR GB (43) 29.03.2006 (30) 16.04.1997 US 834356 (54) Reparatur von Mikrostruckturen durch gasunterstütztes Ätzen mit fokussierten Ionenstrahlen Pattern film repair using a gas assisted focused particle beam system Réparation de couche mince à l'aide d'un système à faisceau ionique focalise à apport de gaz (73) FEI COMPANY, 7451 NW Evergreen Parkway, Hillsboro, OR 97124-5830, US (72) Doyle, Andrew, Derry, NH 03038, US Casey, J., David, West Roxbury, MA 02132, US (74) Casey, Lindsay Joseph, et al, FRKelly 27 Clyde Road Ballsbridge, Dublin 4, IE (62) 98915613.8 / 0 976 152 H01L 21/308 → (51) H01L 21/20 H01L 21/321 → (51) C09G 1/02 H01L 21/321 → (51) C09K 3/14 H01L 21/3213 → (51) H01L 21/306 H01L 21/368 → (51) B05D 7/24 H01L 21/465 → (51) H01L 21/306 H01L 21/67 → (51) B08B 3/08 (51) H01L 21/683 (11) 1 129 481 B1 (25) En (26) En (21) 99950164.6 (22) 05.10.1999 (84) DE GB (43) 05.09.2001 (86) US 1999/023114 05.10.1999 (87) WO 2000/021127 2000/15 13.04.2000 (30) 08.10.1998 US 169017 (54) VERFAHREN UND VORRICHTUNG ZUR KOMPENSIERUNG VON ELEKTRISCHEN SPANNUNGEN AUF EINER SCHEIBE IN EINER PLASMABEHANDLUNGSKAMMER METHOD AND DEVICE FOR COMPEN- SATING WAFER BIAS IN A PLASMA PROCESSING CHAMBER PROCEDE ET DISPOSITIF SERVANT A COMPENSER UNE POLARISATION DE TRANCHE DANS UNE CHAMBRE DE TRAITEMENT AU PLASMA (73) LAM RESEARCH CORPORATION, 4650 Cushing Parkway, Fremont, CA 94538, US (72) SCHOEPP, Alan, M., Ben Lomond, CA 95005, US KNOP, Robert, E., Fremont, CA 94536, US OLSON, Christopher, H., El Dorado, CA 95623, US BARNES, Michael, S., San Ramon, CA 94583, US NGO, Tuan, M., Milpitas, CA 95035, US (74) Walker, Ross Thomson, et al, Potts, Kerr & Co. 15 Hamilton Square, Birkenhead Merseyside CH41 6BR, GB (51) H01L 21/683 (11) 1 429 378 B1 C09J 7/02 (25) Ja (26) En (21) 02747725.6 (22) 23.07.2002
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(H01J) II.1(1)<br />
(84) AT BE BG CH CY CZ DK EE ES FI FR GB GR<br />
HR HU IE IS IT LI LT LU LV MC MT NL NO<br />
PL PT RO SE SI SK TR<br />
(72) BEHLING, Rolf, K., O., NL-5656 AE Eindhoven,<br />
NL<br />
(74) Van Velzen, Maaike Mathilde, Philips Intellectual<br />
Property & Standards P.O. Box 220,<br />
5600 AE Eindhoven, NL<br />
H01J 37/04 → (51) G03F 7/20<br />
(51) H01J 37/147 (11) 1 983 549 B1<br />
H01J 37/317<br />
(25) En (26) En<br />
(21) 08154832.3 (22) 18.04.2008<br />
(84) DE FR GB<br />
(43) 22.10.2008<br />
(30) 20.04.2007 JP 2007111528<br />
(54) Vorrichtung zur Bearbeitung mit Strahlen<br />
Beam Processing Apparatus<br />
Appareil de traitement par faisceau<br />
(73) SEN Corporation, an SHI and Axcelis<br />
Company, 10-1 Yoga 4-chome Setagaya-ku,<br />
Tokyo, JP<br />
(72) Tsukihara, Mitsukuni, Saijo-shi Ehime, JP<br />
Kabasawa, Mitsuaki, Saijo-shi Ehime, JP<br />
Matsushita, Hiroshi, Saijo-shi Ehime, JP<br />
Yagita, Takanori, Saijo-shi Ehime, JP<br />
Amano, Yoshitaka, Saijo-shi Ehime, JP<br />
Fujii, Yoshito, Saijo-shi Ehime, JP<br />
(74) Gill, David Alan, W.P. Thompson & Co. 55<br />
Drury Lane, London WC2B 5SQ, GB<br />
H01J 37/305 → (51) H01L 21/306<br />
H01J 37/317 → (51) G03F 7/20<br />
H01J 37/317 → (51) H01J 37/147<br />
H01J 37/32 → (51) C23C 16/5<strong>09</strong><br />
(51) H01J 37/34 (11) 2 075 823 B1<br />
H02H 9/02<br />
(25) En (26) En<br />
(21) 07025085.7 (22) 24.12.2007<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU LV MC MT NL PL<br />
PT RO SE SI SK TR<br />
(43) 01.07.20<strong>09</strong><br />
(54) Stromänderungsbegrenzungsvorrichtung<br />
Current change limiting device<br />
Dispositif de limitation de changement de<br />
courant<br />
(73) Huettinger Electronic Sp. z o. o, Marecka St.<br />
47, 05-220 Zielonka, PL<br />
(72) Klimczak, Andrzej, 01-633 Warsaw, PL<br />
Bugyi, Rafal, 00-264 Warsaw, PL<br />
Ozimek, Pawel, 00-712 Warsaw, PL<br />
(74) Kohler Schmid Möbus, <strong>Patent</strong>anwälte Ruppmannstraße<br />
27, 70565 Stuttgart, DE<br />
H01J 47/02 → (51) G01T 1/29<br />
(51) H01J 61/02 (11) 2 034 5<strong>09</strong> B1<br />
H01J 61/34<br />
(25) Ru (26) De<br />
(21) 06769538.7 (22) 26.05.2006<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU LV MC NL PL PT<br />
RO SE SI SK TR<br />
(43) 11.03.20<strong>09</strong><br />
(86) RU 2006/000272 26.05.2006<br />
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(54) GASENTLADUNGS-REFLEKTORLAMPE<br />
GAS-DISCHARGE REFLECTOR LAMP<br />
LAMPE À DÉCHARGE GAZEUSE À<br />
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(73) Tsay, Victor Ivanovich, Proezd Karamzina, 1-<br />
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<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />
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(74) Jeck, Anton, Jeck - Fleck - Herrmann <strong>Patent</strong>anwälte<br />
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(25) Ja (26) En<br />
(21) 0<strong>09</strong>64741.3 (22) 06.10.2000<br />
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(86) JP 2000/007010 06.10.2000<br />
(87) WO 2002/031871 2002/16 18.04.2002<br />
(54) APPARAT UND METHODE FÜR DIE HER-<br />
STELLUNG EINES POLYKRISTALLINEN<br />
SILIZIUMFILMS<br />
METHOD AND APPARATUS FOR<br />
PRODUCING A POLYCRYSTALLINE<br />
SILICON FILM<br />
PROCEDE ET DISPOSITIF DE PRODUC-<br />
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TALLIN<br />
(73) MITSUBISHI DENKI KABUSHIKI KAISHA, 7-<br />
3, Marunouchi 2-chome, Chiyoda-ku Tokyo<br />
100-8310, JP<br />
Seiko Epson Corporation, 4-1, Nishishinjuku<br />
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(72) OGAWA, Tetsuya, MITSUBISHI DENKI<br />
KABUSHIKI KAISHA, Tokyo 100-8310, JP<br />
TOKIOKA, Hidetada, MITSUBISHI DENKI<br />
KABUSHIKI K., Tokyo 100-8310, JP<br />
NISHIMAE, Junichi, MITSUBISHI DENKI<br />
KABUSHIKI K., Tokyo 100-8310, JP<br />
OKAMOTO, Tatsuki, MITSUBISHI DENKI<br />
KABUSHIKI K., Tokyo 100-8310, JP<br />
SATO, Yukio, MITSUBISHI DENKI<br />
KABUSHIKI KAISHA, Tokyo 100-8310, JP<br />
INOUE, Mitsuo, MITSUBISHI DENKI<br />
KABUSHIKI KAISHA, Tokyo 100-8310, JP<br />
MIYASAKA, Mitsutoshi, SEIKO EPSON<br />
CORPORATION, Suwa-shi, Nagano 392-<br />
8502, JP<br />
JIROKU, Hiroaki, SEIKO EPSON<br />
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8502, JP<br />
(74) Meissner, Bolte & Partner, Anwaltssozietät<br />
GbR Postfach 86 06 24, 81633 München,<br />
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(51) H01L 21/20 (11) 1 386 348 B1<br />
H01L 21/308<br />
(25) En (26) En<br />
(21) 02750893.6 (22) 07.05.2002<br />
(84) AT BE CH CY DE DK ES FI FR GB GR IE IT LI<br />
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(86) EP 2002/005012 07.05.2002<br />
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(72) Ledentsov, Nikolai Nikolaevich, 10717 Berlin,<br />
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(51) H01L 21/306 (11) 1 641 034 B1<br />
H01L 21/3213 H01J 37/305<br />
H01L 21/465 G03F 1/00<br />
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(73) FEI COMPANY, 7451 NW Evergreen<br />
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(72) Doyle, Andrew, Derry, NH 03038, US<br />
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H01L 21/321 → (51) C<strong>09</strong>K 3/14<br />
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H01L 21/465 → (51) H01L 21/306<br />
H01L 21/67 → (51) B08B 3/08<br />
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(25) En (26) En<br />
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SPANNUNGEN AUF EINER SCHEIBE IN<br />
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METHOD AND DEVICE FOR COMPEN-<br />
SATING WAFER BIAS IN A PLASMA<br />
PROCESSING CHAMBER<br />
PROCEDE ET DISPOSITIF SERVANT A<br />
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(73) LAM RESEARCH CORPORATION, 4650<br />
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(72) SCHOEPP, Alan, M., Ben Lomond, CA<br />
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