European Patent Bulletin 2012/09 - European Patent Office
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European Patent Bulletin 2012/09 - European Patent Office

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(G03B) I.1(2)<br />

(72) Bietry, Joseph, Raymond, Rochester, N.Y.<br />

14618, US<br />

Silverstein, Barry, David, Rochester, N.Y.<br />

14618, US<br />

Kruschwitz, Jennifer, Dawn, Rochester, N.Y.<br />

14618, US<br />

(74) Weber, Etienne Nicolas, KODAK Département<br />

Brevets Route de Demigny Z.I Nord B.P 21,<br />

71102 Chalon-sur-Saône, FR<br />

(62) <strong>09</strong>788841.6 / 2 304 498<br />

(51) G03B 21/00 (11) 2 423 745 A1<br />

H04N 5/74 H04N 13/00<br />

(25) En (26) En<br />

(21) 11188377.3 (22) 26.06.20<strong>09</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(30) 11.07.2008 US 171916<br />

(54) Mikrospiegelprojektor mit Laserlicht<br />

Laser illuminated micro-mirror projector<br />

Projecteur à micromiroirs éclairé au laser<br />

(71) Eastman Kodak Company, 343 State Street,<br />

Rochester, New York 14650, US<br />

(72) Bietry, Joseph, Raymond, Rochester, N.Y.<br />

14618, US<br />

Silverstein, Barry, David, Rochester, N.Y.<br />

14618, US<br />

Kruschwitz, Jennifer, Dawn, Rochester, N.Y.<br />

14618, US<br />

(74) Weber, Etienne Nicolas, KODAK Département<br />

Brevets Route de Demigny Z.I Nord B.P 21,<br />

71102 Chalon-sur-Saône, FR<br />

(62) <strong>09</strong>788841.6 / 2 304 498<br />

G03B 21/00 → (51) G02B 26/10<br />

(51) G03B 42/02 (11) 2 423 746 A1<br />

H04N 5/335 A61B 6/00<br />

(25) En (26) En<br />

(21) 11175561.7 (22) 27.07.2011<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO RS SE SI SK SM TR<br />

BA ME<br />

(30) 26.08.2010 JP 2010189697<br />

(54) Röntgenbilderfassungssystem und -verfahren<br />

Radiographic image capture system and<br />

method<br />

Système et procédé de capture d'images<br />

radiographiques<br />

(71) Fujifilm Corporation, 26-30 Nishiazabu 2chome,<br />

Minato-ku Tokyo, JP<br />

(72) Enomoto, Jun, Kanagawa, JP<br />

(74) Klunker . Schmitt-Nilson . Hirsch, Destouchesstraße<br />

68, 80796 München, DE<br />

(51) G03F 1/14 (11) 2 423 747 A1<br />

G03F 1/16 H01L 21/027<br />

(25) Ja (26) En<br />

(21) 10766760.2 (22) 02.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/000605 02.02.2010<br />

(87) WO 2010/122697 2010/43 28.10.2010<br />

(30) 22.04.20<strong>09</strong> JP 20<strong>09</strong>103628<br />

(54) MEMBRAN FÜR LITHOGRAPHIEDRUCK<br />

UND HERSTELLUNGSVERFAHREN DA-<br />

FÜR<br />

PELLICLE FOR LITHOGRAPHY AND<br />

MANUFACTURING METHOD THEREOF<br />

PELLICULE POUR LITHOGRAPHIE ET<br />

PROCÉDÉ DE FABRICATION DE CELLE-CI<br />

(71) Shin-Etsu Chemical Co., Ltd., 6-1,<br />

Ohtemachi 2-chome Chiyoda-ku, Tokyo 100-<br />

0005, JP<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

(72) AKIYAMA, Shoji, Annaka-shi Gunma 379-<br />

0195, JP<br />

KUBOTA, Yoshihiro, Annaka-shi Gunma 379-<br />

0195, JP<br />

(74) Gill, David Alan, W.P. Thompson & Co. 55<br />

Drury Lane, London WC2B 5SQ, GB<br />

G03F 1/16 → (51) G03F 1/14<br />

(51) G03F 7/11 (11) 2 423 748 A1<br />

B41C 1/10<br />

(25) En (26) En<br />

(21) 11179274.3 (22) 30.08.2011<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO RS SE SI SK SM TR<br />

BA ME<br />

(30) 31.08.2010 JP 2010195224<br />

(54) Lithographiedruckplattenvorläufer und<br />

Plattenherstellungsverfahren dafür<br />

Lithographic printing plate precursor and<br />

plate making method thereof<br />

Précurseur de plaque d'impression lithographique<br />

et procédé de fabrication de<br />

plaque correspondant<br />

(71) Fujifilm Corporation, 26-30 Nishiazabu 2chome,<br />

Minato-ku Tokyo, JP<br />

(72) Suzuki, Shota, Shizuoka, JP<br />

Ishiguro, Yuriko, Shizuoka, JP<br />

(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />

Arabellastraße 4, 81925 München,<br />

DE<br />

(51) G03F 7/20 (11) 2 423 749 A1<br />

(25) En (26) En<br />

(21) 11174617.8 (22) 20.07.2011<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO RS SE SI SK SM TR<br />

BA ME<br />

(30) 24.08.2010 US 376653 P<br />

(54) Lithografische Vorrichtung und Verfahren<br />

zur Herstellung einer Vorrichtung<br />

A lithographic apparatus and device<br />

manufacturing method<br />

Appareil lithographique et procédé de<br />

fabrication d'un dispositif<br />

(71) ASML Netherlands BV, Corporate IP De Run<br />

6501, 5504 DR Veldhoven, NL<br />

(72) Westerklaren, Jan, 5384 WZ Heesch, NL<br />

Van Der Pasch, Engelbertus, 5688 EG Oirschot,<br />

NL<br />

Steijaert, Peter, 5653 LM Eindhoven, NL<br />

Van De Mast, Franciscus, 5646 BD Eindhoven,<br />

NL<br />

Janssen, Gerardus, 5645 KM Eindhoven, NL<br />

(74) Corcoran, Gregory Martin Mason, ASML<br />

Netherlands B.V. CIP De Run 6501, 5504 DR<br />

Veldhoven, NL<br />

(51) G03F 7/20 (11) 2 423 750 A2<br />

(25) De (26) De<br />

(21) 11178274.4 (22) 22.08.2011<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO RS SE SI SK SM TR<br />

BA ME<br />

(30) 23.08.2010 DE 102010035111<br />

(54) Beleuchtungseinheit und Vorrichtung zur<br />

lithografischen Belichtung<br />

Exposure unit and device for lithographic<br />

exposure<br />

Unité d'éclairage et dispositif d'éclairage<br />

lithographique<br />

(71) Fraunhofer-Gesellschaft zur Förderung der<br />

angewandten Forschung e.V., Hansastrasse<br />

27c, 80686 München, DE<br />

(72) Zeitner, Uwe D., 99423 Weimar, DE<br />

322<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>09</strong>/<strong>2012</strong>) 29.02.<strong>2012</strong><br />

Harzendorf, Torsten, 07743 Jena, DE<br />

Stürzebecher, Lorenz, 07745 Jena, DE<br />

(74) Epping - Hermann - Fischer, <strong>Patent</strong>anwaltsgesellschaft<br />

mbH Ridlerstrasse 55, 80339<br />

München, DE<br />

(51) G03F 7/30 (11) 2 423 751 A1<br />

B01D 29/11 B01D 36/02<br />

B41N 3/00<br />

(25) Ja (26) En<br />

(21) 10767178.6 (22) 23.04.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/057297 23.04.2010<br />

(87) WO 2010/123123 2010/43 28.10.2010<br />

(30) 24.04.20<strong>09</strong> JP 20<strong>09</strong>107051<br />

23.04.2010 JP 2010100379<br />

(54) ENTWICKLUNGSGERÄT, VERFAHREN<br />

ZUR VERARBEITUNG EINER ENTWICK-<br />

LUNGSFLÜSSIGKEIT, VERFAHREN ZUR<br />

HERSTELLUNG EINER DRUCKPLATTE<br />

UND FILTRIERVORRICHTUNG<br />

DEVELOPING APPARATUS, METHOD FOR<br />

PROCESSING DEVELOPER LIQUID,<br />

METHOD FOR PRODUCING PRINTING<br />

PLATE, AND FILTRATION DEVICE<br />

APPAREIL DE DÉVELOPPEMENT,<br />

PROCÉDÉ DE TRAITEMENT DE LIQUIDE<br />

DE RÉVÉLATEUR, PROCÉDÉ POUR<br />

PRODUIRE UNE PLAQUE D'IMPRESSION<br />

ET DISPOSITIF DE FILTRATION<br />

(71) Asahi Kasei E-Materials Corporation, 1-105,<br />

Kanda Jinbocho, Chiyoda-ku Tokyo 101-<br />

8101, JP<br />

(72) SUZUKI, Kenji, Tokyo 101-8101, JP<br />

SHIBANO, Masafumi, Tokyo 101-8101, JP<br />

(74) Tack, Jens, Strehl Schübel-Hopf & Partner<br />

Maximilianstrasse 54, D-80538 München,<br />

DE<br />

G03G 5/05 → (51) G03G 5/14<br />

G03G 5/05 → (51) G03G 5/147<br />

G03G 5/06 → (51) G03G 5/147<br />

(51) G03G 5/14 (11) 2 423 752 A1<br />

G03G 5/05<br />

(25) En (26) En<br />

(21) 11174495.9 (22) 19.07.2011<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO RS SE SI SK SM TR<br />

BA ME<br />

(30) 27.08.2010 JP 2010191210<br />

(54) Elektrofotografisches lichtempfindliches<br />

Element, Prozesskartusche und elektrofotografische<br />

Vorrichtung<br />

Electrophotographic photosensitive<br />

member, process cartridge, and electrophotographic<br />

apparatus<br />

Élément électro-photographique photosensible,<br />

cartouche de traitement et appareil<br />

électro-photographique<br />

(71) Canon Kabushiki Kaisha, 30-2 Shimomaruko<br />

3-chome Ohta-ku, Tokyo 146-8501, JP<br />

(72) Maruyama, Akihiro, Tokyo, Tokyo 146-8501,<br />

JP<br />

Sekido, Kunihiko, Tokyo, Tokyo 146-8501,<br />

JP<br />

Sekiya, Michiyo, Tokyo, Tokyo 146-8501, JP<br />

Nagasaka, Hideaki, Tokyo, Tokyo 146-8501,<br />

JP<br />

Takagi, Shinji, Tokyo, Tokyo 146-8501, JP<br />

(74) TBK, Bavariaring 4-6, 80336 München, DE<br />

(51) G03G 5/147 (11) 2 423 753 A1<br />

G03G 5/06 G03G 5/05

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