Deutsche Tagung f ¨ur Forschung mit ... - SNI-Portal

Materialien/Werkstoffe Poster: Do., 13:00–15:30 D-P373
Ultra high resolution heavy ion ERD and its application in the field of
future microelectronic materials
Andreas Bergmaier 1 , Günther Dollinger 1
1 Universität der Bundeswehr München, LRT 2, Werner-Heisenberg-Weg 39, D-85577
Neubiberg
Ultra thin films with thicknesses smaller than 10 nm are now widely used e.g. in
the field of microelectronics and neutron optics and there is ongoing research in the
development of smart films in this fields. The physical properties of these films depend
on stoichiometry, impurity content and surface and interface structures of the thin
films. Therefore, there is a strong need for the elemental characterisation of those films
where high accuracy and optimum depth resolution is required.
In the last years the high resolution elastic recoil detection experiment at the Munich
tandem accelerator, using a Q3D magnetic spectrograph was optimized for ultra thin
films analysis. The talk will demonstrate the achievements in terms of depth resolution,
sensitivity and accuracy. The potential of the method will be demonstrated on
several applications where high resolution ERD is the most valuable tool for elemental
profiling.