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Nanostrukturen und Grenzflächen Poster: Do., 13:00–15:30 D-P311<br />

Characterization of InGaN/GaN nano-islands by grazing incidence x-ray<br />

diffraction<br />

Th. Schmidt 1 , M. Siebert 1 , J. I. Flege 1 , S. Figge 1 , T. Yamaguchi 1 , D.<br />

Hommel 1 , J. Falta 1<br />

1 Inst. of Solid State Physics, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen<br />

InGaN quantum dots (QDs) embedded in GaN offer a great potential for applications<br />

in light e<strong>mit</strong>ting devices. Depending on the In concentration, a wide spectral range<br />

can be covered. In comparison to InGaN/GaN quantum-well based structures, InGaN<br />

quantum dots embedded in GaN are especially advantageous, e. g. because a smaller<br />

laser threshold is expected. In this context, information about the size, shape, chemical<br />

composition, and the strain state of such islands is necessary. Grazing incidence x-ray<br />

diffraction (GIXRD) is ideally suited for this purpose, as has already been shown for<br />

different material systems such as GaN/AlN [1], CdZnSe/ZnSe [2], or InGaAs/GaAs<br />

[3]. Here, we present the first grazing incidence x-ray characterization of InGaN/GaN<br />

nano-islands.<br />

GIXRD experiments were performed ex-situ in the so-called z-axis setup [4] at the BW1<br />

undulator beamline at HASYLAB (Hamburg, Germany), using a focussed monochromatic<br />

beam at 10 keV photon energy. Reciprocal space maps were recorded in the<br />

vicinity of different reflections. InGaN/GaN(0001) samples were grown on sapphire<br />

(0001) substrates by metal-organic vapor pressure epitaxy (MOVPE) at our institute<br />

in Bremen. Samples with different InGaN deposition temperatures were investigated.<br />

For InGaN growth at T = 650 ◦ C, we find that the InxGa1−xN islands are virtually<br />

completely relaxed, and based on Vegard’s law, an In concentration of x ≈ 0.60 follows<br />

for these islands. For lower growth temperature (T = 600 ◦ C), broad reflections<br />

indicate the presence of small islands which are found to be coherently strained.<br />

In addition, samples grown by molecular beam epitaxy (MBE) on MOVPE templates<br />

were investigated. For an InGaN growth temperature of T = 450 ◦ C, fully relaxed<br />

islands are observed. The In concentration of these islands is as high as x ≈ 0.86. This<br />

value is found to be significantly reduced after MBE overgrowth with GaN cap layers.<br />

In comparison to as-grown QD layers, additional reflections occur for the overgrown<br />

samples. Especially for stacked QD layers, these reflections become intense. This is<br />

explained by the progressive formation of stacking faults and of regions with cubic<br />

crystal structure during MBE overgrowth.<br />

[1] V. Chamard et al., Appl. Phys. Lett. 79 (2001) 1971<br />

[2] T. Passow, H. Heinke, Th. Schmidt, J. Falta, A. Stockmann, H. Selke, P. L. Ryder,<br />

K. Leonardi, and D. Hommel, Phys. Rev. B 64 (2001) 193311<br />

[3] K. Zhang, J. Falta, Th. Schmidt, Ch. Heyn, G. Materlik, and W. Hansen, Appl.<br />

Phys. Lett. 72 (2000) 199<br />

[4] M. Lohmann and E. Vlieg, J. Appl. Cryst. 26 (1993) 706

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