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Struktur und Dynamik Poster: Mi., 14:00–16:30 M-P119<br />

Dewetting of thin solid films under swift heavy ion irradiation<br />

Thunu Bolse 1 , Mirco Kreis 1 , Hartmut Paulus 1 , Klara Lyutovich 2 , Wolfgang<br />

Bolse 1<br />

1 Institut für Strahlenphysik, Universität Stuttgart – 2 Institut für Halbleitertechnik,<br />

Universität Stuttgart<br />

Incomplete wetting or dewetting plays an important role in thin film systems, be it for<br />

the growth of the film, its stability or chemical reactions and phase formation taking<br />

place at the interface. Dewetting usually occurs when the film is in its liquid state or<br />

at least near to its melting point (in case of glasses). Here we report about our recent<br />

observation that dewetting also may occur when a thin metal oxide film (NiO, Fe2O3,<br />

TiO2, some tens of nm thicknes) grown on untreated Si-substrate is bombarded with<br />

swift heavy ions, even when the film is kept at liquid nitrogen temperature. Similar to<br />

what was observed in case of thin molten polymer films [1] we could identify heterogeneous<br />

and homogeneous nucleation taking place at the beginning of the dewetting<br />

process. Dewetting then proceeds by the formation and growth of circular holes with<br />

the removed material piling up in a rim around these holes. By coalescence of the<br />

holes narrow ridges are formed, which finally decay into small droplets because of the<br />

Rayleigh-Plateau instability. Different techniques like SEM, AFM and RBS were used<br />

to analyse the dewetting processes and nucleation mechanisms that occur during the<br />

ion bombardment. We have investigated the basic kinetics involved in these phenomena<br />

by studying the development of the dewetting patterns as a function of different<br />

ion species and energies and the applied fluences as well as their dependence on the<br />

film thicknes.<br />

[1] S. Herminghaus, et al., Science 282 (1998) 916

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