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Methoden und Instrumentierung Poster: Mi., 14:00–16:30 M-P24
Infrared Synchrotron Ellipsometry for analysis of laterally patterned organic
thin films
Michael Gensch 1 , Ulrich Schade 2 , Markus Raschke 3,5 , Leonid Ionov 4 ,
Klaus-Jochen Eichhorn 4 , Karsten Hinrichs 1 , Manfred Stamm 4 , Norbert
Esser 1
1 ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str.
9, 12489 Berlin, Germany – 2 Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung
mbH, Albert-Einstein-Str. 15, 12489 Berlin, Germany – 3 Max Born
Institute Nichtlineare Optik Kurzzeitspektroskopie, Max-Born Str. 2A, 12489 Berlin,
Germany – 4 Leibniz Institut für Polymerforschung Dresden e.V., Hohe Str. 6, 01069
Dresden – 5 Department of Chemistry, University of Washington, Seattle, WA 98195-
1700, USA
A specially designed infrared spectroscopic ellipsometer is presented that enables the
investigation of sample areas of less than 1 mm 2 with monolayer sensitivity. This
sensitivity is achieved for films on metallic as well as on semiconducting substrates
by utilizing infrared synchrotron radiation at BESSY II [1]. Measurement principle
and performance of the instrument are discussed for selected examples and the recent
upgrades of the set-up are introduced. It is shown how thickness, structure and
composition of patterned nanofilms can be derived from the analysis of the infrared
ellipsometric parameters [2]. These parameters are of technological relevance to understand
the functionality of e. g. stimuli responsive 1D polymer brush gradient films [3],
biomedical array sensors, or monomolecular films for solar cell applications. Furthermore,
infrared optical constants as determined from microfocus IR ellipsometry allow
for a detailed analysis of the results from other techniques, e. g. scanning nearfield
infrared microscopy (SNIM) [4].
[1] U. Schade, A. Röseler, E.H. Korte, F. Bartl, K.P. Hofmann, T. Noll, W.B. Peatman,
Rev. Sci. Instr. 73 (2002) 1568.
[2] K. Hinrichs, M. Gensch, and N. Esser, Appl. Spectrosc. 59 (2005) 272A.
[3] L. Ionov, A. Sidorenko, K.J. Eichhorn, M. Stamm, and S. Minko, Langmuir 21
(2005) 8711.
[4] M.B. Raschke , L. Molina, T. Elsaesser, D.H. Kim, W. Knoll, and K. Hinrichs,
ChemPhysChem 6 (2005) 2197.