"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
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Carbon–Carbon Double Bonds 89<br />
the addition <strong>of</strong> silyl radicals to double bonds is a remarkably facile process. The<br />
rate constants for the reaction <strong>of</strong> Et3Si: radical with non-activated olef<strong>in</strong>s are<br />
ca 10 6 M 1 s 1 , whereas olef<strong>in</strong>s hav<strong>in</strong>g the double bond next to a p-electron<br />
system or to an electron-withdraw<strong>in</strong>g substituent are substantially more reactive.<br />
K<strong>in</strong>etic data for silyl radicals other than triethylsilyl are scant. <strong>In</strong> Table 5.1<br />
these limited data are reported, and the reactivity trend, i.e.,<br />
Et3Si: > Me3SiSi(:)Me2 > (TMS) 3Si:, observed for a group removal from a<br />
particular alkyl halide (cf Chapter 4) seems to hold for the addition to a<br />
particular alkene, too.<br />
Arrhenius parameters are available for the reaction <strong>of</strong> Et3Si: radicals with<br />
H2C w CH(CH2) 3CH3,H2C w CHPh and H2C w CCl2 [13]. Their preexponential<br />
factors are between 10 9:0 and 10 9:4 M 1 s 1 , which implies that the transition<br />
states for these reactions are fairly ‘loose’. The high reactivity <strong>of</strong> silyl radicals<br />
towards olef<strong>in</strong>s has been expla<strong>in</strong>ed <strong>in</strong> terms <strong>of</strong> polar effects <strong>in</strong> some detail [16].<br />
The addition <strong>of</strong> silyl radicals to alkenes is also a strongly exothermic reaction. It<br />
is estimated from thermochemical background that the addition <strong>of</strong> Me3Si:<br />
radicals to simple CH2 w CH2 is exothermic by 105 kJ/mol [16]. The addition <strong>of</strong><br />
Me3Si: and Me3SiSi(:)Me2 radicals to olef<strong>in</strong>ic monomers us<strong>in</strong>g semiempirical<br />
Table 5.1 Rate constants (M 1 s 1 ) for the addition <strong>of</strong> silyl radicals to alkenes<br />
Substrate Et3Si:a Me3SiSi(:)Me 2 b (TMS) 3Si:c<br />
Cl<br />
CN 1:1 10 9 6:3 10 7<br />
CO 2Me 9:7 10 7<br />
CO 2Me<br />
Cl<br />
4:6 10 8<br />
2:7 10 8<br />
Ph 2:2 10 8 5:9 10 7<br />
O 1:2 10 6<br />
a From Reference [13].<br />
b From Reference [14].<br />
c From Reference [15].<br />
1:4 10 8b 7:6 10 7<br />
4:8 10 6 3:9 10 6<br />
9:6 10 5<br />
9:4 10 5