"Front Matter". In: Organosilanes in Radical Chemistry - Index of

"Front Matter". In: Organosilanes in Radical Chemistry - Index of "Front Matter". In: Organosilanes in Radical Chemistry - Index of

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78 Reducing Agents An interesting variant of the above mentioned reaction is the use of 1,1,2,2tetraphenyldisilane. The reductions of alkyl bromides [110], phenyl chalcogenides [111] and xanthates [112] have been performed using either AIBN in refluxing ethanol or Et3B=O2 at room temperature. Yields varied from moderate to excellent, depending on the experimental conditions. Two examples with 3-cholestanyl bromide and 2-phenylseleno sugar are given in Reaction (4.70) and (4.71). Disilanes having para-fluoro or para-methoxy phenyl substituents showed similar reactivities [110–112]. Br Ph Ph Ph Si Si Ph H H (2.4 equiv) Et 3B, O 2, r.t. (4.70) 99% OAc Ph Ph Ph Si Si Ph OAc AcO O OEt H H (2.4 equiv) AcO O OEt (4.71) Et3B, O2 , r.t. AcO SePh AcO 79% 4.4.4 ALKYLTHIO SUBSTITUTED SILICON HYDRIDES Substitution at the SiH moiety has been carried out with alkylthio groups, such as MeS and i-PrS. Tris(alkylthio)silanes, (RS) 3SiH, are radical-based reducing agents which can effect the reduction of bromides, iodides, xanthates, phenylselenides and isocyanides in toluene, using AIBN at 85 8C as the initiator (Reaction 4.71) [113]. The reduction of chlorides is efficient only when astabilizing groups or gem-dichlorides are present. It is interesting to note that under the reduction conditions and in the absence of substrates the reagent is consumed, forming (RS) 4Si, probably by a SH2 reaction at the sulfur atom [113]. By replacing a Me3Si group in (TMS) 3SiH with the thiol group Me3SiS, the resulting silicon hydride behaves similarly (Reaction 4.72) [114]. Thiolsubstituted silicon hydrides have not found an application in synthetic procedures so far, probably due to their unpleasant smell. X (MeS) 3 SiH AIBN, 85 �C >96% X=Br, I, OC(S)SMe, SePh, CN − (4.71)

Silicon Hydride / Thiol Mixture 79 X (Me 3Si) 2Si(H)SSiMe 3 X=Br, I, OC(S)SMe, SePh, CN 4.5 SILICON HYDRIDE / THIOL MIXTURE AIBN, 85 �C (4.72) >_ 97% The low reactivity of alkyl and/or phenyl substituted organosilanes in reduction processes can be ameliorated in the presence of a catalytic amount of alkanethiols. The reaction mechanism is reported in Scheme 4.6 and shows that alkyl radicals abstract hydrogen from thiols and the resulting thiyl radical abstracts hydrogen from the silane. This procedure, which was termed polarity-reversal catalysis, has been applied to dehalogenation, deoxygenation and desulfurization reactions [115]. R + XSH RH + XS XS + Et3SiH XSH + Et3Si Et3Si + RZ Et3SiZ + R Scheme 4.6 Propagation steps for polarity-reversal catalysis For example, 1-bromoadamantane is quantitatively reduced with 2 equiv of triethylsilane and in the presence of a catalytic amount of tert-dodecanethiol (Reaction 4.73). Similarly desulfurization Reaction (4.74) occurs readily. Although generally these reactions do not work in the absence of thiol, the reduction of xanthate derivatives give similar yields in the presence or absence of thiol. To account for this result, it was suggested that Et3SiSH is formed in situ by side reactions, thus obviating the need to add a separate thiol catalyst [116]. Indeed, a variety of alkyl and/or aryl substituted silanes (R3SiH) react under normal free radical conditions with carbonyl sulfide (O w C S), a by- w product of Barton–McCombie deoxygenation, to give the corresponding silanethiol (R3SiSH) (see also Section 5.5) [117]. Br Et 3 SiH (2 equiv) t-C 12 H 25 SH (2 mol%) t-BuONNOBu-t, 70 �C 99% (4.73)

78 Reduc<strong>in</strong>g Agents<br />

An <strong>in</strong>terest<strong>in</strong>g variant <strong>of</strong> the above mentioned reaction is the use <strong>of</strong> 1,1,2,2tetraphenyldisilane.<br />

The reductions <strong>of</strong> alkyl bromides [110], phenyl chalcogenides<br />

[111] and xanthates [112] have been performed us<strong>in</strong>g either AIBN <strong>in</strong><br />

reflux<strong>in</strong>g ethanol or Et3B=O2 at room temperature. Yields varied from moderate<br />

to excellent, depend<strong>in</strong>g on the experimental conditions. Two examples with<br />

3-cholestanyl bromide and 2-phenylseleno sugar are given <strong>in</strong> Reaction (4.70)<br />

and (4.71). Disilanes hav<strong>in</strong>g para-fluoro or para-methoxy phenyl substituents<br />

showed similar reactivities [110–112].<br />

Br<br />

Ph Ph<br />

Ph Si Si Ph<br />

H H<br />

(2.4 equiv)<br />

Et 3B, O 2, r.t.<br />

(4.70)<br />

99%<br />

OAc<br />

Ph<br />

Ph Ph<br />

Si Si Ph<br />

OAc<br />

AcO<br />

O<br />

OEt<br />

H H<br />

(2.4 equiv)<br />

AcO<br />

O<br />

OEt (4.71)<br />

Et3B, O2 , r.t.<br />

AcO SePh<br />

AcO<br />

79%<br />

4.4.4 ALKYLTHIO SUBSTITUTED SILICON HYDRIDES<br />

Substitution at the SiH moiety has been carried out with alkylthio groups, such<br />

as MeS and i-PrS. Tris(alkylthio)silanes, (RS) 3SiH, are radical-based reduc<strong>in</strong>g<br />

agents which can effect the reduction <strong>of</strong> bromides, iodides, xanthates, phenylselenides<br />

and isocyanides <strong>in</strong> toluene, us<strong>in</strong>g AIBN at 85 8C as the <strong>in</strong>itiator<br />

(Reaction 4.71) [113]. The reduction <strong>of</strong> chlorides is efficient only when astabiliz<strong>in</strong>g<br />

groups or gem-dichlorides are present. It is <strong>in</strong>terest<strong>in</strong>g to note that<br />

under the reduction conditions and <strong>in</strong> the absence <strong>of</strong> substrates the reagent is<br />

consumed, form<strong>in</strong>g (RS) 4Si, probably by a SH2 reaction at the sulfur atom<br />

[113]. By replac<strong>in</strong>g a Me3Si group <strong>in</strong> (TMS) 3SiH with the thiol group Me3SiS,<br />

the result<strong>in</strong>g silicon hydride behaves similarly (Reaction 4.72) [114]. Thiolsubstituted<br />

silicon hydrides have not found an application <strong>in</strong> synthetic procedures<br />

so far, probably due to their unpleasant smell.<br />

X<br />

(MeS) 3 SiH<br />

AIBN, 85 �C<br />

>96%<br />

X=Br, I, OC(S)SMe, SePh, CN −<br />

(4.71)

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