"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
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Other Silicon Hydrides 73<br />
The decrease <strong>in</strong> reactivity for monohalogenated compounds along the series I<br />
> Br > Cl is also due <strong>in</strong> part to a decrease <strong>of</strong> the preexponential factor, which<br />
has been attributed to the dim<strong>in</strong>ished importance <strong>of</strong> the charge-transfer <strong>in</strong>teractions<br />
along this series. Rate constants for the reaction <strong>of</strong> the Et3Si: radical<br />
with a series <strong>of</strong> r<strong>in</strong>g-substituted benzyl chlorides were also obta<strong>in</strong>ed. A<br />
Hammett plot gives a r ¼þ0:64, one <strong>of</strong> the largest positive r values reported<br />
for a free-radical reaction that is <strong>in</strong>dicative <strong>of</strong> the strong nucleophilic character<br />
<strong>of</strong> silyl radicals [93].<br />
The reactions <strong>of</strong> trichloro- and tetrachloroethylene with Et3Si: have been<br />
studied <strong>in</strong> detail [94]. With the former, Et3Si: radicals undergo addition as well<br />
as Cl abstraction, and at 65 8C these reactions proceed at almost equal rates.<br />
With tetrachloroethylene, Et3Si: radicals proceed more that 95 % via Reaction<br />
(4.56) with a rate constant <strong>of</strong> 1:0 10 7 M 1 s 1 at 27 8C [95].<br />
Et 3Si<br />
Cl Cl<br />
Cl<br />
+ Et3SiCl + (4.56)<br />
Cl Cl<br />
Cl Cl<br />
Absolute rate constants for the reaction <strong>of</strong> Et3Si: with a variety <strong>of</strong> sulfonyl<br />
halides (Reaction 4.57) have been measured by laser flash photolysis [96,97].<br />
For sulfonyl chlorides, the rate constants are very high, approach<strong>in</strong>g the diffusion-controlled<br />
limit and are almost <strong>in</strong>dependent <strong>of</strong> the substituent, i.e., the rate<br />
constants at ca 25 8C are 3:2 10 9 ,4:6 10 9 ,5:4 10 9 and 7:5 10 9 M 1 s 1<br />
for MeSO2Cl, PhSO2Cl, Me2NSO2Cl and EtOSO2Cl, respectively. Polar contributions,<br />
similar to those <strong>in</strong> Equation (4.55) have also been proposed for such<br />
fast processes. Sulfonyl fluorides also react with Et3Si: radicals <strong>in</strong> a similar<br />
fashion. Rate constants for MeSO2F and p-Me-C6H4SO2F are found to be<br />
1:3 10 7 and 0:9 10 7 M 1 s 1 , respectively, at room temperature.<br />
Et3Si: þ RSO2X !Et3SiX þ RSO2: ð4:57Þ<br />
4.4.2 PHENYL SUBSTITUTED SILICON HYDRIDES<br />
Phenyl or mixed alkyl/phenyl substituted silicon hydrides show similar reactivities<br />
to trialkylsilanes. <strong>In</strong>deed, by replac<strong>in</strong>g one alkyl by a phenyl group the<br />
effect on the hydrogen donat<strong>in</strong>g ability <strong>of</strong> SiH moiety <strong>in</strong>creases, only slightly<br />
(see Section 3.1). As an example, the rate constant for hydrogen abstraction by<br />
primary alkyl radical from Ph3SiH is about one order <strong>of</strong> magnitude higher than<br />
from Et3SiH. The rate constants for halogen abstraction by the phenyl substituted<br />
silyl radicals are collected <strong>in</strong> Table 4.5. The reactivity trends <strong>of</strong><br />
t-BuPh2Si: and Ph3Si: are similar and for a particular RX the rate constants<br />
range between Et3Si: (smaller) and (TMS) 3Si: (higher).<br />
Although under canonical radical cha<strong>in</strong> conditions these silanes are poor<br />
reduc<strong>in</strong>g agents, there are some <strong>in</strong>terest<strong>in</strong>g applications, <strong>in</strong> particular, us<strong>in</strong>g<br />
Ph2SiH2 [100]. For example, the reaction <strong>of</strong> a variety <strong>of</strong> substituted adamantanes