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"Front Matter". In: Organosilanes in Radical Chemistry - Index of

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66 Reduc<strong>in</strong>g Agents<br />

RH<br />

(TMS) 3 SiH<br />

(TMS) 3 Si<br />

R<br />

R O SMe<br />

S Si(TMS) 3<br />

O SMe<br />

S<br />

R O SMe<br />

S Si(TMS) 3<br />

Scheme 4.3 Propagation steps for the reaction <strong>of</strong> cyclohexyl xanthate with<br />

(TMS) 3 SiH<br />

variety 2 0 ,3 0 -didehydro-2 0 ,3 0 -dideoxy derivatives <strong>of</strong> ribonucleosides were prepared.<br />

From a mechanistic po<strong>in</strong>t <strong>of</strong> view, the <strong>in</strong>itial propagation steps are<br />

similar to Scheme 4.3 until the formation <strong>of</strong> R:, followed by a b-elim<strong>in</strong>ation<br />

to give the olef<strong>in</strong> and a radical fragment that cont<strong>in</strong>ues the cha<strong>in</strong> by hydrogen<br />

abstraction from the silane.<br />

O<br />

O<br />

PhNHC(S)O<br />

OC(S)NHPh<br />

O<br />

O<br />

(TMS) 3SiH<br />

AIBN, 80 �C<br />

4.3.4 MISCELLANEOUS REACTIONS<br />

O<br />

O<br />

84%<br />

O<br />

O<br />

(4.39)<br />

Isocyanides can be reduced to the correspond<strong>in</strong>g hydrocarbon by (TMS) 3SiH<br />

[43]. The reaction can be considered a smooth route for the deam<strong>in</strong>ation<br />

<strong>of</strong> primary am<strong>in</strong>es, through the preparation <strong>of</strong> isocyanides via formylation<br />

and dehydration. The efficiency <strong>of</strong> the reduction is <strong>in</strong>dependent from the nature<br />

<strong>of</strong> the alkyl substituent. That is, primary, secondary, and tertiary isocyanides<br />

at 80 8C gave the correspond<strong>in</strong>g hydrocarbons <strong>in</strong> good yields. Two examples<br />

are given <strong>in</strong> Reactions (4.40) and (4.41) [1,43]. The key step for these cha<strong>in</strong><br />

reactions is expected to be the fragmentation <strong>of</strong> the <strong>in</strong>termediate radical<br />

derived from the fast addition <strong>of</strong> (TMS) 3Si: radical to the specific substrate<br />

(Table 4.3).

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