"Front Matter". In: Organosilanes in Radical Chemistry - Index of

"Front Matter". In: Organosilanes in Radical Chemistry - Index of "Front Matter". In: Organosilanes in Radical Chemistry - Index of

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26 Thermochemistry R3Si w H !R3Si: þ H: DH(R3Si w H) (2:1) R3Si: þ e !R3Si EA(R3Si:) (2:11) H: !H þ þ e IP(H:) (2:12) R3Si w H !R3Si þ H þ DHacid ¼ DH(R3Si w H) EA(R3Si:) þ IP(H:) (2:13) links the gas-phase acidity of silane (DHacid) to the bond dissociation enthalpy of Si w H, the electron affinity of the silyl radical and the ionization potential of a hydrogen atom. Equation (2.13) can be used to obtain different parameters depending on what information is already known [22,23]. The EAs of a variety of silyl radicals have been measured by means of electron photodetachment experiments (Table 2.5), in which the anion population was monitored as a function of the wavelength of irradiating light [26,27]. It is worth mentioning that the EAs reported in Table 2.5 indicate that (i) replacement of a hydrogen by a methyl group decreases EA, the effect being cumulative, (ii) substitution of a phenyl for hydrogen has essentially no effect on EA, and (iii) replacement of a hydrogen by a Me3Si group increases EA, the effect being cumulative. EAs of H3Si: (1.39 eV), H2FSi: (1.53) and H2ClSi: (1.44) have been calculated at the MP4SDTQ/6–311þþG(2df,p) level [28]. Gas-phase acidities of a few R3SiH have been measured by the equilibrium method and are expected to be quite accurate (see Table 2.5, third column in roman). The bond dissociation enthalpies in Table 2.5 (last column in italic) were calculated using Equation (2.13) and the appropriate DHacid and EA data together with the IP(H:) ¼ 13:6 eV. These DH(R3Si w H) values, although associated with large errors (any errors in DHacid or EA propagate into DH), are in good agreement with those available from equilibrium kinetics studies (cf. Table 2.1) and indicate that replacement of a hydrogen by a phenyl group decreases the Si w H bond strength by 6–7 kJ/mol. Analogously, Equation (2.13) has been used to estimate DHacid values when EA and DH(R3Si w H) are available (see Table 2.5, third column in italic). Since gas-phase acidity reactions are always endothermic, larger values of DHacid correspond to weaker acids. Therefore, H4Si is 54 kJ/mol stronger acid than Me3SiH and 92 kJ/mol weaker acid than (Me3Si) 3SiH whereas both H4Si and PhSiH3 have about the same acidity. For a comparison with carbon analogues, Me3CH is 17 kJ/mol stronger acid than H4C whereas H4C is 151 kJ/mol stronger acid than PhCH3 [25]. Negative-ion thermodynamic cycles similar to the one mentioned above can be easily constructed in order to estimate the energetics of the two fragmentation paths associated with the radical anion R3SiH : (Scheme 2.1). However, EAs of silanes in Table 2.5 are unknown. Considering the Si w H bond dissociation of Me3SiH : as an example (Reaction 2.14), the thermochemical cycle in Equation (2.15) links DHacid to the DH(Me3SiH : ). Assuming

Ion Thermochemistry 27 Table 2.5 Electron affinities of silyl radicals together with gas-phase acidities and bond dissociation enthalpies of silanes a Silane (R3SiH) EA(R3Si:) (eV) DHacid(R3Si w H) b (kJ=mol) DH(R3Si w H) b (kJ=mol) H3Si w H 1:41 0:03 1560 8 383 8 MeSiH2 w H 1:19 0:03 1583 8 386 12 Me2SiH w H 1:07 0:02 1601 392 c Me3Si w H 0:97 0:03 1616 397.4 c PhSiH2 w H 1:44 0:01 1551 8 377 8 PhMeSiH w H 1:33 0:04 1566 8 382 12 Me2Si(H)SiMe2 w H 1:40 0:03 1555 378 d,e (Me3Si) 2SiH w H 1:94 0:08 (Me3Si) 3Si w H 2:03 0:09 1468 351.5 d a Taken from References [25,26], unless otherwise mentioned. b Experimental data in roman and calculated values from Equation (2.13) in italic. c From Table 2.1. d From Table 2.2. e For Me3SiSiMe2 w H. that EA(Me3SiH) EA(Me4Si) ¼ 3:8 eV [29], a bond strength of 670 kJ/mol is calculated. Me3SiH : !Me3Si þ H: (2:14) DH(Me3SiH : ) ¼ DHacid(Me3SiH) IP(H:) þ EA(Me3SiH) (2:15) 2.3.2 HYDRIDE-AFFINITY CYCLES Thermodynamic properties related to R3SiH can also be obtained from the hydride-affinities of R3Siþ . The following thermochemical cycle (cf. Scheme 2.1): R3Si H !R3Si: þ H: DH(R3Si H) (2:1) w w R3Si: !R3Si þ þ e IP(R3Si:) (2:16) H: þ e !H EA(H:) (2:17) R3Si w H !R3Si þ þ H DHbase ¼ DH(R3Si w H) þ IP(R3Si:) EA(H:) (2:18) links the gas-phase basicity of silane (DHbase) to the bond dissociation enthalpy of Si w H, the ionization potential of the silyl radical and the electron affinity of a hydrogen atom. Equation (2.18) can be used to obtain different parameters depending on what information is already known [22,23].

Ion Thermochemistry 27<br />

Table 2.5 Electron aff<strong>in</strong>ities <strong>of</strong> silyl radicals together with gas-phase acidities and bond<br />

dissociation enthalpies <strong>of</strong> silanes a<br />

Silane (R3SiH) EA(R3Si:)<br />

(eV)<br />

DHacid(R3Si w H) b<br />

(kJ=mol)<br />

DH(R3Si w H) b<br />

(kJ=mol)<br />

H3Si w H 1:41 0:03 1560 8 383 8<br />

MeSiH2 w H 1:19 0:03 1583 8 386 12<br />

Me2SiH w H 1:07 0:02 1601 392 c<br />

Me3Si w H 0:97 0:03 1616 397.4 c<br />

PhSiH2 w H 1:44 0:01 1551 8 377 8<br />

PhMeSiH w H 1:33 0:04 1566 8 382 12<br />

Me2Si(H)SiMe2 w H 1:40 0:03 1555 378 d,e<br />

(Me3Si) 2SiH w H 1:94 0:08<br />

(Me3Si) 3Si w H 2:03 0:09 1468 351.5 d<br />

a Taken from References [25,26], unless otherwise mentioned.<br />

b Experimental data <strong>in</strong> roman and calculated values from Equation (2.13) <strong>in</strong> italic.<br />

c From Table 2.1.<br />

d From Table 2.2.<br />

e For Me3SiSiMe2 w H.<br />

that EA(Me3SiH) EA(Me4Si) ¼ 3:8 eV [29], a bond strength <strong>of</strong> 670 kJ/mol is<br />

calculated.<br />

Me3SiH : !Me3Si þ H: (2:14)<br />

DH(Me3SiH : ) ¼ DHacid(Me3SiH) IP(H:) þ EA(Me3SiH) (2:15)<br />

2.3.2 HYDRIDE-AFFINITY CYCLES<br />

Thermodynamic properties related to R3SiH can also be obta<strong>in</strong>ed from the<br />

hydride-aff<strong>in</strong>ities <strong>of</strong> R3Siþ . The follow<strong>in</strong>g thermochemical cycle (cf. Scheme<br />

2.1):<br />

R3Si H !R3Si: þ H: DH(R3Si H) (2:1)<br />

w w<br />

R3Si: !R3Si þ þ e IP(R3Si:) (2:16)<br />

H: þ e !H EA(H:) (2:17)<br />

R3Si w H !R3Si þ þ H DHbase ¼ DH(R3Si w H) þ IP(R3Si:) EA(H:) (2:18)<br />

l<strong>in</strong>ks the gas-phase basicity <strong>of</strong> silane (DHbase) to the bond dissociation enthalpy<br />

<strong>of</strong> Si w H, the ionization potential <strong>of</strong> the silyl radical and the electron aff<strong>in</strong>ity <strong>of</strong><br />

a hydrogen atom. Equation (2.18) can be used to obta<strong>in</strong> different parameters<br />

depend<strong>in</strong>g on what <strong>in</strong>formation is already known [22,23].

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