"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
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226 <strong>In</strong>dex<br />
Triethylsilane<br />
as mediator with monosubstituted<br />
alkene 153<br />
reduc<strong>in</strong>g agent 70–71<br />
Si w H dissociation enthalpy 22t<br />
with am<strong>in</strong>yl 39t<br />
with aroyloxyl 42<br />
with benzophenone triplet 44t<br />
with cumylperoxyl 40t<br />
with perfluoroalkyl 36t<br />
with primary alkyl 33t<br />
with [1.1.1]propellane 97<br />
with tert-butoxyl 40t<br />
with tertiary alkyl 36t<br />
with thiocarbonyl derivatives 71<br />
with thiyl 42, 43t<br />
Triethylsilyl radical<br />
addition to alkene 89, 89t<br />
addition to alkyne 98<br />
with alkyl bromide 72t<br />
with alkyl chloride 72t<br />
with alkyl iodide 72t<br />
addition to carbon-nitrogen double<br />
bond 108,109t<br />
addition to carbonyl compound 100,<br />
101, 102t<br />
with polyhalogenated compound 72t<br />
with sulfonyl halide 73<br />
addition to term<strong>in</strong>al alkene 153<br />
Trimethylsilane<br />
enthalpy <strong>of</strong> formation 21t<br />
gas-phase acidity 27t<br />
gas-phase basicity 28t<br />
Si w H dissociation enthalpy 21t<br />
Trimethylsilyl radical<br />
addition to alkene 88, 89, 90<br />
addition to cumulene and heterocumulene<br />
109t, 110<br />
electron aff<strong>in</strong>ity 27t<br />
enthalpy <strong>of</strong> formation 21, 21t, 24<br />
ionization potential 28t<br />
self-term<strong>in</strong>ation 51<br />
Triphenylsilane<br />
with am<strong>in</strong>yl 39t<br />
with cumylperoxyl 40t<br />
methylenelactone 95<br />
with monosubstituted acetylene 98<br />
with phenyl 36t<br />
with primary alkyl 33t<br />
with tert-butoxyl 40t<br />
tertiary alkyl 36t<br />
with thiyl 42, 43t<br />
Triphenylsilyl radical with alkyl<br />
chloride 74t<br />
Triphenylt<strong>in</strong> hydride 125, 126, 131, 136<br />
Triqu<strong>in</strong>ane 151, 179<br />
Tris(methylthio)silane<br />
reduc<strong>in</strong>g agent 78<br />
Si w H dissociation enthalpy 22t<br />
Tris(trimethylsilyl)silane<br />
autoxidation 190, 191, 192, 192s<br />
gas-phase acidity 27t<br />
reduc<strong>in</strong>g agent 53–54, 57<br />
Si w H dissociation enthalpy 22t<br />
with acyl radical 36t<br />
with acid chloride 58<br />
with aldehyde 105<br />
with alkyl chloride 57, 58<br />
with alkyl bromide 55, 56<br />
with alkyl iodide 55<br />
with alkyl isocyanide 67<br />
with alkyl selenide 60<br />
with alkyl sulfide 59, 60<br />
with allyl phenyl sulfide 96<br />
with am<strong>in</strong>yl radical 39t<br />
with aryloxyl radical 41<br />
with benzophenone triplet 44t<br />
with a-chiral disubstituted olef<strong>in</strong> 94<br />
with cumylperoxyl radical 40t<br />
with dialkyl ketone 102, 103<br />
with diethyl methyl fumarate 93<br />
with disubstituted acetylene 99<br />
with gem-dichloride 58<br />
with gem-disubstituted olef<strong>in</strong> 92<br />
with methylmaleic anhydride 93<br />
with monosubstituted acetylene 98, 99<br />
with monosubstituted olef<strong>in</strong> 92<br />
with nitro derivatives 68<br />
with nitroxide 67<br />
with oxygen 70, 193<br />
with perfluoroalkyl radical 36t<br />
with peroxyl radical 193,<br />
with phenyl radical 36t<br />
with phenyl selenoester 61