"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
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<strong>In</strong>dex 223<br />
Si w Si dissociation enthalpy 21<br />
5–Hexenyl radical 32, 150<br />
methyl substituted 150s<br />
6–Hexenyl radical 151<br />
H<strong>in</strong>der am<strong>in</strong>e light stabilizer (HALS) 197,<br />
198<br />
Homolytic substitution<br />
aromatic 90, 180<br />
bimolecular (SH2) 61, 62s, 133<br />
backside attack 133, 134<br />
frontside attack 133, 134<br />
<strong>in</strong>tramolecular (SHi) 133, 134, 135, 136,<br />
169, 187, 188<br />
SHi reaction at silicon 134, 135, 136<br />
( )-Horsfil<strong>in</strong>e 177<br />
Hydride-aff<strong>in</strong>ity cycle 27<br />
Hydr<strong>in</strong>danone 170<br />
Hydrogenatomwithsiliconhydride 44,45t<br />
Hydrogen-term<strong>in</strong>ated porous silicon<br />
photooxidation 205<br />
preparation 203<br />
Hydrogen-term<strong>in</strong>ated Si(100)<br />
addition to monosubstituted olef<strong>in</strong> 213,<br />
214s<br />
preparation 203, 213<br />
Hydrogen-term<strong>in</strong>ated Si(111)<br />
addition to aldehyde 210<br />
addition to monosubstituted<br />
acetylene 210, 210f<br />
addition to monosubstituted olef<strong>in</strong> 208,<br />
209, 209s, 210<br />
comparison with<br />
tris(trimethylsilyl)silane 203, 206<br />
FTIR spectrum 205, 205f<br />
halogenation 208<br />
oxidation mechanism 106, 207s<br />
photooxidation 205<br />
preparation 203<br />
surface pattern 211, 211f, 212, 212f<br />
Hydrogen-term<strong>in</strong>ated silicon surface 202,<br />
203, 204, 204f<br />
Hydrosilylation <strong>of</strong> alkene 92–97<br />
diastereoselectivity 93<br />
enantioselectivity 95<br />
radical-based mechanism 88<br />
by silylated cyclohexadiene 97<br />
stereoselectivity 93<br />
thiol-promoted 95<br />
transition metal catalysis 87<br />
Hydrosilylation <strong>of</strong> alkyne 98, 99<br />
Hydrosilylation <strong>of</strong> carbonyl<br />
compound 102–106<br />
with PhSeSiMe3=Bu3SnH method<br />
105, 106<br />
stereoselectivity 103, 104<br />
thiol-promoted 104<br />
Hydrosilylation <strong>of</strong> enynes 159, 165<br />
<strong>In</strong>tramolecular hydrosilylation<br />
alkenyloxysilane 121, 123, 125<br />
carbon-carbon double bond 119–125<br />
carbon-carbon triple bond 124–126<br />
silylated cyclohexadiene 123, 124s<br />
thiol-promoted 121<br />
Ion thermochemistry 25–28<br />
Isogyric reaction 23<br />
Isomerization cis/trans 90, 91f, 92, 99<br />
K<strong>in</strong>etic isotope effect 34, 37<br />
( )-Kumausallene 156<br />
Lactam 58, 61, 148, 162, 166, 167, 168, 169<br />
Lactone 145,160<br />
Laser flash photolysis 40, 40t, 44, 44t, 51,<br />
71, 73, 80, 97, 200, 202<br />
Lewis acid complexation 159, 165<br />
Macrocyclization 168, 176<br />
Mucoc<strong>in</strong> 157<br />
Multiple scatter<strong>in</strong>g Xa 15<br />
Narciclas<strong>in</strong>e 171<br />
Negative-ion cycle 26<br />
Neophyl radical rearrangement 32, 172<br />
Nitroxide 2, 41, 67, 68, 68s, 112, 113, 198<br />
Nucleoside analogue 55, 56, 58, 60, 64, 65,<br />
71, 171<br />
Organic monolayer<br />
AFM image 212f<br />
derivatization 215<br />
pattern by mask<strong>in</strong>g procedure 211,<br />
211f, 212, 212f<br />
synthesis 209, 210, 213