18.12.2012 Views

"Front Matter". In: Organosilanes in Radical Chemistry - Index of

"Front Matter". In: Organosilanes in Radical Chemistry - Index of

"Front Matter". In: Organosilanes in Radical Chemistry - Index of

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

<strong>In</strong>dex 223<br />

Si w Si dissociation enthalpy 21<br />

5–Hexenyl radical 32, 150<br />

methyl substituted 150s<br />

6–Hexenyl radical 151<br />

H<strong>in</strong>der am<strong>in</strong>e light stabilizer (HALS) 197,<br />

198<br />

Homolytic substitution<br />

aromatic 90, 180<br />

bimolecular (SH2) 61, 62s, 133<br />

backside attack 133, 134<br />

frontside attack 133, 134<br />

<strong>in</strong>tramolecular (SHi) 133, 134, 135, 136,<br />

169, 187, 188<br />

SHi reaction at silicon 134, 135, 136<br />

( )-Horsfil<strong>in</strong>e 177<br />

Hydride-aff<strong>in</strong>ity cycle 27<br />

Hydr<strong>in</strong>danone 170<br />

Hydrogenatomwithsiliconhydride 44,45t<br />

Hydrogen-term<strong>in</strong>ated porous silicon<br />

photooxidation 205<br />

preparation 203<br />

Hydrogen-term<strong>in</strong>ated Si(100)<br />

addition to monosubstituted olef<strong>in</strong> 213,<br />

214s<br />

preparation 203, 213<br />

Hydrogen-term<strong>in</strong>ated Si(111)<br />

addition to aldehyde 210<br />

addition to monosubstituted<br />

acetylene 210, 210f<br />

addition to monosubstituted olef<strong>in</strong> 208,<br />

209, 209s, 210<br />

comparison with<br />

tris(trimethylsilyl)silane 203, 206<br />

FTIR spectrum 205, 205f<br />

halogenation 208<br />

oxidation mechanism 106, 207s<br />

photooxidation 205<br />

preparation 203<br />

surface pattern 211, 211f, 212, 212f<br />

Hydrogen-term<strong>in</strong>ated silicon surface 202,<br />

203, 204, 204f<br />

Hydrosilylation <strong>of</strong> alkene 92–97<br />

diastereoselectivity 93<br />

enantioselectivity 95<br />

radical-based mechanism 88<br />

by silylated cyclohexadiene 97<br />

stereoselectivity 93<br />

thiol-promoted 95<br />

transition metal catalysis 87<br />

Hydrosilylation <strong>of</strong> alkyne 98, 99<br />

Hydrosilylation <strong>of</strong> carbonyl<br />

compound 102–106<br />

with PhSeSiMe3=Bu3SnH method<br />

105, 106<br />

stereoselectivity 103, 104<br />

thiol-promoted 104<br />

Hydrosilylation <strong>of</strong> enynes 159, 165<br />

<strong>In</strong>tramolecular hydrosilylation<br />

alkenyloxysilane 121, 123, 125<br />

carbon-carbon double bond 119–125<br />

carbon-carbon triple bond 124–126<br />

silylated cyclohexadiene 123, 124s<br />

thiol-promoted 121<br />

Ion thermochemistry 25–28<br />

Isogyric reaction 23<br />

Isomerization cis/trans 90, 91f, 92, 99<br />

K<strong>in</strong>etic isotope effect 34, 37<br />

( )-Kumausallene 156<br />

Lactam 58, 61, 148, 162, 166, 167, 168, 169<br />

Lactone 145,160<br />

Laser flash photolysis 40, 40t, 44, 44t, 51,<br />

71, 73, 80, 97, 200, 202<br />

Lewis acid complexation 159, 165<br />

Macrocyclization 168, 176<br />

Mucoc<strong>in</strong> 157<br />

Multiple scatter<strong>in</strong>g Xa 15<br />

Narciclas<strong>in</strong>e 171<br />

Negative-ion cycle 26<br />

Neophyl radical rearrangement 32, 172<br />

Nitroxide 2, 41, 67, 68, 68s, 112, 113, 198<br />

Nucleoside analogue 55, 56, 58, 60, 64, 65,<br />

71, 171<br />

Organic monolayer<br />

AFM image 212f<br />

derivatization 215<br />

pattern by mask<strong>in</strong>g procedure 211,<br />

211f, 212, 212f<br />

synthesis 209, 210, 213

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!