"Front Matter". In: Organosilanes in Radical Chemistry - Index of

212 Silyl Radicals in Polymers and Materials
The fabrication of Si(111) surfaces patterned with organic monolayers and
oxide on the 10 mm scale has also been reported [65]. An H w Si(111) surface was
irradiated at 254 nm through a gold minigrid mask (Figure 8.7a) in air for
30 min to create a pattern of silicon oxide on an otherwise hydrogen-terminated
Si(111) surface. Immersion of this sample in deoxygenated 1-decene and irradiation
(300 nm) for 3 h induces hydrosilylation in the remaining hydrogenterminated
surface and results in an oxide/alkyl pattern. AFM and CCD optical
images of these patterned surfaces are shown in Figure 8.7. Figure 8.7b reveals a
well-ordered pattern after exposure to water vapour with the oxide (squares)
being hydrophilic and 1-decene-modified surface (lines) being hydrophobic.
Figure 8.7c shows an organic surface that is topographically higher than the
oxide, whereas in the frictional force mode image (Figure 8.7d) the contrast is
improved by highlighting the silicon oxide squares.
Figure 8.7 140 mm 140 mm images of (a) AFM tapping mode image of the gold minigrid
mask, (b) CCD optical image of the patterned Si(111) surface after exposure to water vapor,
(c) AFM height image of the patterned surface, and (d) AFM image taken in frictional force
mode. Reprinted with permission from Reference [65]. Copyright 2001 American Chemical
Society.