"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
190 Silyl <strong>Radical</strong>s <strong>in</strong> Polymers and Materials<br />
Ph<br />
Si Si Si<br />
H<br />
Ph<br />
Si<br />
H<br />
Ph<br />
Si Si O<br />
H<br />
Ph<br />
H Si<br />
H<br />
O O O<br />
7 8 9 10<br />
Scheme 8.2 Type <strong>of</strong> units assigned <strong>in</strong> oxidized poly(phenylhydrosilane) by 1 H detected<br />
1 H– 29 Si HMQC spectroscopy<br />
1:2 10 2 M 1=2 s 1=2 (referr<strong>in</strong>g to each SiH moiety) were found for poly(phenylhydrosilane)<br />
and poly(n-hexylhydrosilane), respectively, when a benzene<br />
solution <strong>of</strong> polysilane was oxidized under air at 50 8C us<strong>in</strong>g AIBN as the radical<br />
<strong>in</strong>itiator. Moreover, the k<strong>in</strong>etics <strong>of</strong> poly(phenylhydrosilane) oxidation <strong>in</strong> benzene<br />
us<strong>in</strong>g AIBN as the radical <strong>in</strong>itiator was <strong>in</strong>vestigated <strong>in</strong> the temperature<br />
range <strong>of</strong> 58–77 8C by follow<strong>in</strong>g oxygen uptake [16]. The reaction rate showed<br />
the follow<strong>in</strong>g dependences: a first-order on polysilane, a zero-order on oxygen<br />
and a half-order on radical <strong>in</strong>itiator. The cha<strong>in</strong> length <strong>of</strong> oxidation is found to<br />
be relatively long (n > 10). An oxidizability value <strong>of</strong> 10:9 10 2 M 1=2 s 1=2<br />
was measured at 58 8C for the polysilane by this technique, which corresponds<br />
to 0:6 10 2 M 1=2 s 1=2 for each (PhSiH) group.<br />
Based on these <strong>in</strong>vestigations the radical cha<strong>in</strong> reactions for the oxidation <strong>of</strong><br />
poly(phenylhydrosilane) can be described by the reaction sequence shown <strong>in</strong><br />
Scheme 8.3 (see also the follow<strong>in</strong>g section). The <strong>in</strong>itially formed ROO: radical<br />
is able to abstract hydrogen from the polysilane. <strong>In</strong>deed, a rate constant <strong>of</strong><br />
24:7M 1 s 1 (referr<strong>in</strong>g to each SiH moiety) was measured for the reaction <strong>of</strong><br />
cumylperoxyl radical with poly(phenylhydrosilane) [17]. <strong>In</strong> the propagation<br />
steps, the reaction <strong>of</strong> silyl radical with oxygen should be fast and the result<strong>in</strong>g<br />
silylperoxyl radical is expected to rearrange to disilyloxysilyl radical also fast,<br />
whereas the slow step is expected to be the hydrogen abstraction from the<br />
start<strong>in</strong>g polysilane by the disilyloxysilyl radical. Us<strong>in</strong>g the usual steady-state<br />
approximation, the overall rate <strong>of</strong> oxidation is given by Equation (8.3), from<br />
which the oxidizability, kp=(2kt) 1=2 can be obta<strong>in</strong>ed.<br />
d[O2]<br />
dt ¼ Ri þ kp<br />
1=2<br />
[R3SiH](Ri)<br />
1=2<br />
(2kt)<br />
(8:3)<br />
The values <strong>of</strong> oxidizability obta<strong>in</strong>ed for poly(hydrosilane)s are comparable<br />
with the 1:9 10 2 M 1=2 s 1=2 <strong>of</strong> methyl l<strong>in</strong>oleate, an example <strong>of</strong> easily oxidizable<br />
substrate.<br />
8.2.2 (Me3Si) 3SiH AND (Me3Si) 2Si(H)Me AS MODEL COMPOUNDS<br />
(Me3Si) 3SiH as a pure material or <strong>in</strong> solution reacts spontaneously and slowly<br />
at ambient temperature with air or molecular oxygen, to form a major product<br />
that conta<strong>in</strong>s a siloxane cha<strong>in</strong> (Reaction 8.4) [18]. The percentages <strong>of</strong>