"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
112 Addition to Unsaturated Bonds<br />
The adducts <strong>of</strong> azodicarboxylate with Et3Si: or Ph3Si: radicals [79], have<br />
been identified as hydrazyl radicals (Reaction 5.41). The addition <strong>of</strong> R3Si:<br />
radical to alkyl azides takes place at the term<strong>in</strong>al nitrogen (Reaction 5.42)<br />
afford<strong>in</strong>g the triazenyl s-type radical <strong>in</strong> which the SOMO is <strong>in</strong> the NNN<br />
plane (only one canonical structure is shown) [80,81].<br />
R'O2C N N<br />
CO2R' R' N N N<br />
R 3 Si<br />
R 3 Si<br />
R'O2C N N<br />
R3Si CO2R' R' N N N SiR 3<br />
(5.41)<br />
(5.42)<br />
The adducts derived from the reaction <strong>of</strong> a variety <strong>of</strong> alkyl or alkoxyl<br />
substituted silyl radicals with am<strong>in</strong>oboranes have also been recorded [82]. The<br />
silyl radical addition takes place at the boron site to give the am<strong>in</strong>yl-borane<br />
radical (Reaction 5.43) and structural <strong>in</strong>formation for this class <strong>of</strong> radicals has<br />
been obta<strong>in</strong>ed.<br />
N BH 2<br />
R 3 Si<br />
N BH 2 SiR 3 (5.43)<br />
The addition <strong>of</strong> silyl radicals to the N O bond is very well documented.<br />
w<br />
<strong>In</strong>deed, silyl radicals add rapidly to aromatic, heteroaromatic and aliphatic<br />
nitro compounds to give persistent trialkylsilyloxy nitroxide radicals [9].<br />
Rate constants for the addition <strong>of</strong> Et3Si: radical to MeNO2 [13] and <strong>of</strong><br />
(TMS) 3Si: radical to t-BuNO2 [15] are <strong>in</strong> the range <strong>of</strong> 107 –108 M 1 s 1 , respectively,<br />
at room temperature (Table 5.3). Structural <strong>in</strong>formation about a large<br />
number <strong>of</strong> adduct radicals as well as some k<strong>in</strong>etic <strong>in</strong>formation associated with<br />
these species have been obta<strong>in</strong>ed by EPR spectroscopy [83,84]. For example,<br />
Et3Si: radicals add to 2-nitrothiophene to give the silyloxynitroxide that was<br />
detected both <strong>in</strong> the cis and trans arrangements (Reaction 5.44). For the<br />
<strong>in</strong>terconversion <strong>of</strong> the two conformers, an activation energy <strong>of</strong> 49:3kJ=mol<br />
was obta<strong>in</strong>ed [85].<br />
S<br />
N OSiEt 3<br />
O<br />
cis trans<br />
S<br />
N O<br />
OSiEt3 (5.44)<br />
Detailed k<strong>in</strong>etic studies as a function <strong>of</strong> temperature have been carried out on<br />
the fate <strong>of</strong> radicals 58 and 59, derived from the addition <strong>of</strong> Ph3Si: and<br />
(TMS) 3Si: to t-BuNO2 and MeNO2, respectively [86,87]. Activation parameters<br />
for the first-order decay <strong>of</strong> radical 58 ( log A=s 1 ¼ 11:1 and<br />
Ea ¼ 78:7kJ=mol) and radical 59 ( log A=s 1 ¼ 13:5 and Ea ¼ 80:5kJ=mol)