"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
"Front Matter". In: Organosilanes in Radical Chemistry - Index of
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108 Addition to Unsaturated Bonds<br />
5.4 OTHER CARBON–HETEROATOM MULTIPLE BONDS<br />
Addition <strong>of</strong> silyl radicals to carbon–nitrogen multiple bonds has ma<strong>in</strong>ly been<br />
<strong>in</strong>vestigated by EPR spectroscopy [9,66].<br />
Studies on the addition <strong>of</strong> silyl radicals to compounds conta<strong>in</strong><strong>in</strong>g C<br />
w N<br />
bonds are quite extensive [66]. Silicon-centred radicals add to the C N moiety<br />
w<br />
either at the nitrogen or at the carbon atom depend<strong>in</strong>g on the nature <strong>of</strong> the<br />
substituents (Scheme 5.10). <strong>In</strong> the majority <strong>of</strong> cases, the addition at the nitrogen<br />
atom is the preferred one as is expected thermodynamically. Furthermore, it has<br />
been shown by EPR that 1,2-migration <strong>of</strong> the Me3Si group from carbon to<br />
nitrogen <strong>in</strong> the Me3SiCH2N(:)R occurs readily (for R ¼ H, the rate constant is<br />
estimated to be 3 103 s 1 at 27 8C), and it is sensitive to the presence <strong>of</strong><br />
sterically large groups at the nitrogen atom (for R ¼ t-Bu, the rate constant is<br />
estimated to be 3 101 s 1 at 27 8C) [67].<br />
C N<br />
SiR3 C N<br />
+ R3Si silyl migration<br />
R3Si C N<br />
Scheme 5.10 Reaction paths for the addition <strong>of</strong> silyl radicals to C N double bonds<br />
w<br />
The adduct <strong>of</strong> silyl radicals to 4-substituted pyrid<strong>in</strong>es and pyraz<strong>in</strong>e monitored<br />
by EPR results from the attack at the nitrogen atom to give radicals 52<br />
and 53, respectively [68,69]. The rate constant for the addition <strong>of</strong> Et3Si: radical<br />
to pyrid<strong>in</strong>e is about three times faster than for benzene (Table 5.3) [24].<br />
N SiR3 N N SiR3 52 53<br />
The addition <strong>of</strong> the Et3Si: radical to the C N bond <strong>of</strong> nitrones also occurs<br />
w<br />
readily. A rate constant <strong>of</strong> 7:1 107 M 1 s 1 at 27 8C has been obta<strong>in</strong>ed for<br />
Reaction (5.35), whereas <strong>in</strong>formation on the structure <strong>of</strong> the adduct radicals has<br />
been obta<strong>in</strong>ed by EPR spectroscopy [13,70].<br />
O<br />
Ph O<br />
Et3Si + PhCH N<br />
CH N<br />
(5.35)<br />
CMe Si CMe<br />
3<br />
3<br />
The EPR technique has also been employed to <strong>in</strong>vestigate the adducts <strong>of</strong> the<br />
reaction <strong>of</strong> silyl radicals with various nitrile-N-oxides [71]. As an example, the