Semrock Master Catalog 2018

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Fluorophores Single-band Sets Multiband Sets Cubes Laser Sets BrightLine ® Dichroic Super-resolution / TIRF Laser Dichroic Beamsplitters TECHNICAL NOTE incident wavefront reflected wavefront Choosing Dichroic Beamsplitters with Flatness/ RWE Appropriate to the Microscopy Method Wavefront distortion can degrade image quality by reducing contrast or compromising resolution. In several microscopy applications, reducing wavefront distortion is critical to achieving the microscopy method. Specifying and selecting optical filters that minimize wavefront aberration is important to maximize or enable optical system performance. This article elucidates how to select optical filters for high performance microscopy, and provides guidance on choosing Semrock catalog filters for wavefront distortion performance required for applications. reflected flatness wavefront Both standard and advanced microscopy methods require error certain minimum standards of flatness on dichroic beamsplitters. For example, super-resolution and TIRF microscopy cannot be achieved if the flatness of the critical dichroic beamsplitters is worse than required. This Tech Note introduces the topic of how to choose Semrock dichroic beamsplitters appropriate to the microscopy method. incident wavefront reflected wavefront flatness reflected wavefront error Figure [1]: For light incident at an angle upon a dichroic beamsplitter, deviations from flatness cause distortions in the reflected wavefront. Optical filters are generally composed of multi-layered, thin-film coatings on plane, parallel glass substrates. There is variability in substrate flatness, and, additionally, the substrate may slightly bend after coating. For transmitted light, such bending has little effect on transmitted wavefront Total error TWE (TWE) other than a = slight displacement Tiltof the beam axis. However, + for reflected Spherical light, especially light + incident at Irregularity nonperpendicular angles, deviations from flatness TWE (see Contribution Figure 1) have two effects on reflected TWE wavefront Contribution error (RWE): (1) the focal TWE plane Contribution may shift position, or (2) the beam may acquire optical aberrations (e.g., astigmatism). 2 μm Figure [2]: Image sequence demonstrating the effect of substrate bending on image quality. A lower radius of curvature means greater substrate bending. As the radius of curvature decreases (and bending increases), image quality degrades. [Images of F-actin in bovine pulmonary artery endothelial cells (FluoCells® Prepared Slide #1, ThermoFisher Scientific, Waltham, MA, USA) as imaged on a BX41 microscope (Olympus Corporation of the Americas, Center Valley, PA, USA) with a 40×, 0.75NA objective and Retiga camera (QImaging, Surrey, BC, Canada)] NLO Filters Individual Filters Dichroic Beamsplitters incident transmitted incident transmitted wavefront wavefront wavefront wavefront Radius of Curvature (m) ~6 ~1275 Microscopy Technique incident wavefront Flatness Need in a Reflected Excitation Beam transmitted wavefront Widefield Fluorescence Microscopy Non-critical Critical Total Internal Reflection Fluorescence (TIRF) Microscopy Critical Critical incident wavefront A focal plane shift can be corrected by lens or camera adjustment in some microscopy methods, but in others this shift cannot be adjusted for and can therefore impede proper function. Also of significant concern, optical aberrations can degrade image quality, as illustrated in Figure [2], and can compromise the microscopy method. In determining suitable flatness need for a given application, the most important parameter is often the diameter of the beam striking the dichroic beamsplitter surface. Table 2 shows the Semrock product best suited to the application, for maximum diameter values. For more specific information, and for other beam diameter value and microscopy examples, the Semrock White Paper on this topic [1] provides additional information on RWE, TWE, and microscopy methods, as well as guidance from a system designer’s perspective. Because of potential degradation of imaging quality, it is important to determine when the flatness of dichroic beamsplitter is critical to a microscopy method. Table 1 lists examples of popular microscopy techniques in which it is critical to have dichroics of high flatness. As noted in this table, high flatness requirements can apply to both the illumination (excitation) and the detection (emission) light paths. Flatness Need in a Reflected Emission Beam transmitted wavefront Stochastic Switching (PALM, STORM, etc.) Critical Critical Tunable Filters Stimulated Emission Depletion (STED) – Pulsed Microscopy Critical Non-critical Confocal Single-point Scanning Microscopy Critical Non-critical Combining multiple laser beams Critical Not applicable More 68 Table 1: A list of popular standard and advanced microscopy methods, categorized as to criticality of dependence on reflected wavefront flatness. (continued)
Single-band Sets Fluorophores (continued from previous page) Semrock offers an extensive and industry-leading range of catalog filters for a variety of applications with specific Flatness/RWE needs. The Semrock Flatness Classifications listed in Table 2 provide an intuitive approach to selecting products of appropriate flatness for a given application. In determining suitable flatness need for a given application, the most important parameter is often the diameter of the beam striking the dichroic beamsplitter surface. Table 2 shows the Semrock product best suited to the application, for maximum diameter values. For more specific information, and for other beam diameter value and microscopy examples, the Semrock White Paper on this topic [1] provides additional information on RWE, TWE, and microscopy methods, as well as guidance from a system designer’s perspective. Flatness / RWE Classification Super-resolution / TIRF Image-splitting Example Applications TIRF, PALM, STORM, STED Splitting of emission signal on a pixel based detector Nominal Radius of Curvature Maximum Reflected Beam Diameter, mm ~ 1275 meters 22.5
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Semrock 2018 Master Catalog Everyth
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Welcome to the 2018 Master Catalog
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T T T T Laser & Optical System Filt
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SearchLight Optimization Calculator
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The Semrock Advantage Proven Reliab
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BrightLine ® Single-band Sets When
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BrightLine ® Single-band Sets for
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BrightLine ® Multiband Sets for Po
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BrightLine ® Single-band Sets Filt
Page 19 and 20: TECHNICAL NOTE Ultraviolet (UV) Flu
Page 21 and 22: BrightLine ® Single-band Sets for
Page 23 and 24: Qdot ® Single-band Filter Sets Fil
Page 25 and 26: BrightLine ® FRET Single-band Sets
Page 27 and 28: BrightLine ® Basic TM Best-value S
Page 29 and 30: (continued from previous page) Fluo
Page 31 and 32: BrightLine ® Multiband LED Filter
Page 33 and 34: BrightLine ® Multiband Fluorescenc
Page 35 and 36: BrightLine ® Multiband Fluorescenc
Page 37 and 38: Fluorescence Filter Cubes See onlin
Page 39 and 40: BrightLine ® Laser Filter and Set
Page 41 and 42: BrightLine ® Laser Fluorescence Mu
Page 43 and 44: BrightLine ® Laser Fluorescence Fi
Page 45 and 46: TECHNICAL NOTE Sputtered Thin-film
Page 47 and 48: BrightLine ® Multiphoton LaserMUX
Page 49 and 50: Multiphoton Filters Common Specific
Page 51 and 52: BrightLine ® Single-band Bandpass
Page 59 and 60: BrightLine ® Long / Short pass Sin
Page 61 and 62: BrightLine ® Multiband Bandpass Fi
Page 63 and 64: BrightLine ® Multiband Bandpass Fi
Page 65 and 66: BrightLine ® Single-edge Dichroic
Page 67 and 68: BrightLine ® Multiedge Dichroic Be
Page 69: BrightLine ® Dichroic Beamsplitter
Page 73 and 74: BrightLine ® Super-resolution / TI
Page 75 and 76: BrightLine ® Laser Multiedge Dichr
Page 77 and 78: LaserMUX TM Beam Combining Filters
Page 79 and 80: TECHNICAL NOTE Measurement of Optic
Page 81 and 82: VersaChrome ® Tunable Filters TECH
Page 83 and 84: VersaChrome ® Tunable Bandpass Fil
Page 85 and 86: VersaChrome Edge TM Tunable Filters
Page 87 and 88: Laser Wavelength Reference Table La
Page 89 and 90: Polarization Filters Common Specifi
Page 91 and 92: General Purpose Mirrors Semrock gen
Page 93 and 94: EdgeBasic TM Long / Short Wave Pass
Page 95 and 96: Edge Steepness and Transition Width
Page 97 and 98: RazorEdge ® Common Specifications
Page 99 and 100: Filter Types for Raman Spectroscopy
Page 101 and 102: MaxLine ® Laser-line Spectra and S
Page 103 and 104: Near Infrared Bandpass Filters Tran
Page 105 and 106: StopLine ® Single-notch Filter Com
Page 107 and 108: TECHNICAL NOTE Filter Spectra at No
Page 109 and 110: Working with Optical Density Optica
Page 111 and 112: LEARN MORE WITH OUR VIDEO COLLECTIO
Page 113 and 114: The Physics of Pixel Shift Pixel sh
Page 115 and 116: Get the Right Solution, Right Now W
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