Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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E-<strong>Beam</strong> Direct Write: Possible <strong>Applications</strong><br />
Test Structures <strong>for</strong> technology learning and tool qualification<br />
Personalization<br />
ASIC Structuring<br />
Ground rule, cell concept and device learning<br />
Metal fix applications <strong>for</strong> 130nm and 90nm technologies<br />
Chip shuttle <strong>for</strong> macro verification<br />
Main focus Qimonda Main focus <strong>for</strong> logic companies<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 6 Confidential<br />
Increasing complexity
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