Applications for Maskless E-Beam Lithography between ... - Sematech

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Motivation • Decision Mid 2004 for acquisition of a Variable Shaped Electron Beam Lithography in Dresden for shared use of Infineon and AMD • E-Beam Business Cases for support of R&D existing • E-Beam has great potential to facilitate optical litho, technology development and product engineering (mask cost, time to silicon) • Further, more sophisticated applications to a later date conceivable � Therefore participation of Infineon/Qimonda in European Programs for Mask less Lithograph (ML2) • Manufacturing Lithography Strategy of Qimonda unchanged Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 4 Confidential
Center of Competence E-Beam at QD P RDC • Own Group at Qimonda Dresden Research & Development Center (Head: Berndt Tropper) with additional resources from optical litho department, integration and etch (total: 9 persons) • Main objective: device learning
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3: Table of Contents E-Beam Lithograph
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 9 and 10: Table of Contents E-Beam Lithograph
Page 11 and 12: Mission or Fraunhofer CNT Center Na
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19 and 20: Status Exposure Results: Negative R
Page 21 and 22: Table of Contents E-Beam Lithograph
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

Applications for Maskless E-Beam Lithography between ... - Sematech

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