Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Motivation<br />
• Decision Mid 2004 <strong>for</strong> acquisition of a Variable Shaped Electron <strong>Beam</strong><br />
<strong>Lithography</strong> in Dresden <strong>for</strong> shared use of Infineon and AMD<br />
• E-<strong>Beam</strong> Business Cases <strong>for</strong> support of R&D existing<br />
• E-<strong>Beam</strong> has great potential to facilitate optical litho, technology<br />
development and product engineering (mask cost, time to silicon)<br />
• Further, more sophisticated applications to a later date conceivable<br />
� There<strong>for</strong>e participation of Infineon/Qimonda in European Programs<br />
<strong>for</strong> Mask less Lithograph (ML2)<br />
• Manufacturing <strong>Lithography</strong> Strategy of Qimonda unchanged<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 4 Confidential
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