Applications for Maskless E-Beam Lithography between ... - Sematech

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Team of E-<strong>Beam</strong> Competence Center • Christian Arndt (optical litho) • Maik Bootsmann (integration) • Kang-Hoon Choi (resist, track, metrology) • Christoph Hohle (resist screening and process) • Katja Keil, PhD • Johannes Kretz (project manager) • Tarek Lutz (device, alignment, proximity, tool) • M. Tesauro (etch) • Frank Thrum (Data Prep, KERF, fracturing) Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 28 Confidential
Thank you The World’s Leading Creative Memory Company Johannes Kretz
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 11 and 12: Mission or Fraunhofer CNT Center Na
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19 and 20: Status Exposure Results: Negative R
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27: Acknowledgement The Qimonda part of

Applications for Maskless E-Beam Lithography between ... - Sematech

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