Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Acknowledgement<br />
The Qimonda part of the work <strong>for</strong> this paper was partly supported by<br />
the EFRE fund of the European Community and by funding of the<br />
State Saxony of the Federal Republic of Germany (project number<br />
10746) and partly by the Federal Ministry of Education and Research<br />
of the Federal Republic of Germany (Project No 01M3167A). The<br />
authors are responsible <strong>for</strong> the content of the paper.<br />
Thanks to:<br />
• Center of Competence E-<strong>Beam</strong>, Frank-Michael Kamm<br />
• VISTEC Jena<br />
• Karl-Heinz Kliem, Elke Kilgus, Monika Böttcher, Uli Denker, Lutz Bettin, Bernd<br />
Brendel, Dirk Beyer, Hans-Joachim Döring<br />
• IMS Chips<br />
• Mathias Irmscher, Anatol Schwersenz, Holger Sailer<br />
• Fraunhofer CNT<br />
• Peter Kücher<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 27 Confidential
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