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Applications for Maskless E-Beam Lithography between ... - Sematech

Applications for Maskless E-Beam Lithography between ... - Sematech

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Summary<br />

• VSB E-<strong>Beam</strong> <strong>Lithography</strong> established in Dresden<br />

• Patterning Ready <strong>for</strong> Internal and External Customers<br />

• Use <strong>for</strong> 300mm applications <strong>for</strong> future device and technology<br />

learning<br />

• Use of FhG network and National / European funding <strong>for</strong><br />

process development<br />

• Process-learning <strong>for</strong> future mask-less litho tools<br />

• Strong potential <strong>for</strong> mask-less lithography in R&D<br />

Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 26 Confidential

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