Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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PML2<br />
SEMATECH Litho Forum<br />
Vancouver, 22-May-2005<br />
E - beam evolution at Vistec<br />
Device engineering Fast prototyping Low volume production<br />
Litho ++ Litho+ Litho<br />
VB6 SB350DW PML2 R&D Project<br />
Gaussian <strong>Beam</strong><br />
1 Gaussian pixel / flash <strong>Beam</strong><br />
Shaped Shaped <strong>Beam</strong> <strong>Beam</strong><br />
100 pixels / flash<br />
Multi <strong>Beam</strong> Array<br />
Multi <strong>Beam</strong><br />
> 10,000 pixels / flash<br />
Increasing throughput<br />
Increasing complexity<br />
IMS<br />
Nanofabrication<br />
23
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