Applications for Maskless E-Beam Lithography between ... - Sematech

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IMS Nanofabrication PML2 Project Status IMS-Jena
PML2 SEMATECH Litho Forum Vancouver, 22-May-2005 E - beam evolution at Vistec Device engineering Fast prototyping Low volume production Litho ++ Litho+ Litho VB6 SB350DW PML2 R&D Project Gaussian Beam 1 Gaussian pixel / flash Beam Shaped Shaped Beam Beam 100 pixels / flash Multi Beam Array Multi Beam > 10,000 pixels / flash Increasing throughput Increasing complexity IMS Nanofabrication 23
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 9 and 10: Table of Contents E-Beam Lithograph
Page 11 and 12: Mission or Fraunhofer CNT Center Na
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19 and 20: Status Exposure Results: Negative R
Page 21: Table of Contents E-Beam Lithograph
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

Applications for Maskless E-Beam Lithography between ... - Sematech

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