Applications for Maskless E-Beam Lithography between ... - Sematech

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Status Exposure Results: Positive Resist 50nm L/S 70nm CH iso dense (7-lines) dense (wide lines) (Pitch 180nm) Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 20 Confidential
Table of Contents E-<strong>Beam</strong> <strong>Lithography</strong> at Qimonda in Dresden Project Environment (Qimonda, Fraunhofer, VISTEC, IMS) Technical Results Future: ML2 Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 21 Confidential
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 9 and 10: Table of Contents E-Beam Lithograph
Page 11 and 12: Mission or Fraunhofer CNT Center Na
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19: Status Exposure Results: Negative R
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

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