Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Status Exposure Results: Negative Resist<br />
50nm<br />
L/S<br />
70nm<br />
Dots<br />
iso dense (7-lines) dense (wide lines)<br />
(Pitch 180nm)<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 19 Confidential