Applications for Maskless E-Beam Lithography between ... - Sematech

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P-CAR Benchmarking Result (dense pattern) Resist F Resist G Resist I Resist J Resist K 50nm 55nm 60nm 70nm 100nm Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 18 Confidential
Status Exposure Results: Negative Resist 50nm L/S 70nm Dots iso dense (7-lines) dense (wide lines) (Pitch 180nm) Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 19 Confidential
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 11 and 12: Mission or Fraunhofer CNT Center Na
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17: Resist Benchmarking at IMS Chips Ex
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

Applications for Maskless E-Beam Lithography between ... - Sematech

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