Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Resist Benchmarking at IMS Chips<br />
Extensive benchmarking of >30 positive and negative chemically amplified<br />
resists <strong>for</strong> direct write applications per<strong>for</strong>med at IMS Chips<br />
• Multiple (small volume) samples supplied by all major resist vendors<br />
• Identification of p& n-CARs <strong>for</strong> 50nm DRAM node applications meeting basic<br />
resist requirements<br />
• Resist improvement clearly visible<br />
– Multiple learning cycles observed with several suppliers<br />
– Commercialization of most advanced samples<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 17 Confidential
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