Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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CNT Competence Areas<br />
<strong>for</strong> High-Per<strong>for</strong>mance Data Processing and Logic<br />
Materials<br />
Unit Process &<br />
Modules<br />
Areas Competence Reference Fab<br />
Equipment<br />
� New materials<br />
- storage cell<br />
- isolation concepts<br />
- conductor<br />
-transistor<br />
� Metrology and Analytics<br />
� Innovative Process Solutions<br />
� Enabling Patterning<br />
AMD Fab 36<br />
300mm<br />
IFX SC300<br />
300mm<br />
page 14
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