Applications for Maskless E-Beam Lithography between ... - Sematech

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Research Challenge: … Fast Integration of Innovative Processes/Technologies and Equipment into Manufacturing Sequential Basic Research Integrated Basic Research Applied Research > 5 years Applied Research ~ 3 years Development Product Technology CNT Development Product Technology Pilot Product Pilot Product Volume Ramp Volume Ramp • No Feedback • Independent • Technology driven • Fast Feedback from market • Interacting • Application driven page 12
European Nanotechnology Plat<strong>for</strong>m - Concept page 13
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 11: Mission or Fraunhofer CNT Center Na
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19 and 20: Status Exposure Results: Negative R
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
Page 25 and 26: PML2 SEMATECH Litho Forum Vancouver
Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

Applications for Maskless E-Beam Lithography between ... - Sematech

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