Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Research Challenge: … Fast Integration of Innovative<br />
Processes/Technologies and Equipment into Manufacturing<br />
Sequential<br />
Basic Research<br />
Integrated<br />
Basic<br />
Research<br />
Applied Research<br />
> 5 years<br />
Applied Research<br />
~ 3 years<br />
Development<br />
Product<br />
Technology<br />
CNT<br />
Development<br />
Product<br />
Technology<br />
Pilot<br />
Product<br />
Pilot<br />
Product<br />
Volume<br />
Ramp<br />
Volume<br />
Ramp<br />
• No Feedback<br />
• Independent<br />
• Technology driven<br />
• Fast Feedback<br />
from market<br />
• Interacting<br />
• Application driven<br />
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