Applications for Maskless E-Beam Lithography between ... - Sematech

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Project Construct • Collaboration between Qimonda, CNT and external Partners • Resist benchmarking & process development @ IMS Chips • Timeframe: October 04 – Mid 08 • National Funding (BMBF with Fraunhofer: SWITCH, SOHAR) • European Programs (FOREMOST) • Synergies to other (NGL) technologies – Mask applications – Nano-imprint (resist process) –EUV Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 10 Confidential S J DD
Mission or Fraunhofer CNT Center Nanoelectronic Technologies � a public-private partnership � the most efficient platform to develop � innovative processing solutions � for fast implementation in microelectronic devices � in the nanoelectronic era in Germany / Europe page 11
Page 1 and 2: Applications for Mask-less E-Beam L
Page 3 and 4: Table of Contents E-Beam Lithograph
Page 5 and 6: Center of Competence E-Beam at QD P
Page 7 and 8: 2005 Timeline E-Beam Project 4 5 6
Page 9: Table of Contents E-Beam Lithograph
Page 13 and 14: European Nanotechnology Platform -
Page 15 and 16: CNT Layout acces to CNT offices pag
Page 17 and 18: Resist Benchmarking at IMS Chips Ex
Page 19 and 20: Status Exposure Results: Negative R
Page 21 and 22: Table of Contents E-Beam Lithograph
Page 23 and 24: PML2 SEMATECH Litho Forum Vancouver
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Page 27 and 28: Acknowledgement The Qimonda part of
Page 29: Thank you The World’s Leading Cre

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