Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
Applications for Maskless E-Beam Lithography between ... - Sematech
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Project Construct<br />
• Collaboration <strong>between</strong> Qimonda, CNT and external Partners<br />
• Resist benchmarking & process development @ IMS Chips<br />
• Timeframe: October 04 – Mid 08<br />
• National Funding (BMBF with Fraunhofer: SWITCH, SOHAR)<br />
• European Programs (FOREMOST)<br />
• Synergies to other (NGL) technologies<br />
– Mask applications<br />
– Nano-imprint (resist process)<br />
–EUV<br />
Qimonda · Johannes Kretz · QD P RDC EBEAM · May 24, 2006 · Page 10 Confidential<br />
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