Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
Approach<br />
IBM Systems and Technology Group<br />
Collect stage traces<br />
Generate wett<strong>in</strong>g maps<br />
Design <str<strong>on</strong>g>of</str<strong>on</strong>g> experiments<br />
Expose wafers<br />
Data analysis<br />
6 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
Resist Height<br />
ULT<br />
Build scatterometer library<br />
Measure <strong>CD</strong><br />
Top <strong>CD</strong><br />
Mid <strong>CD</strong><br />
Side wall<br />
angle<br />
Bottom <strong>CD</strong><br />
© 2003 IBM Corporati<strong>on</strong>
Change language