Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
IBM Systems and Technology Group<br />
Photoresist Comp<strong>on</strong>ent Extracti<strong>on</strong> by Water<br />
� Extracti<strong>on</strong> rate depends <strong>on</strong>:<br />
– Type <str<strong>on</strong>g>of</str<strong>on</strong>g> comp<strong>on</strong>ent<br />
– Initial distributi<strong>on</strong> <strong>in</strong> resist<br />
– Water c<strong>on</strong>tact time<br />
– Presence <str<strong>on</strong>g>of</str<strong>on</strong>g> a topcoat<br />
– Water penetrati<strong>on</strong> <strong>in</strong>to resist<br />
3 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
Extracted Photoacid (nmol/ml)<br />
0.9<br />
0.8<br />
0.7<br />
0.6<br />
0.5<br />
0.4<br />
0.3<br />
0.2<br />
0.1<br />
0<br />
Data from Greg Wallraff, Carl Lars<strong>on</strong><br />
PAG1<br />
PAG2<br />
PAG3<br />
6 60 300<br />
Water Extracti<strong>on</strong> <str<strong>on</strong>g>Time</str<strong>on</strong>g> (sec)<br />
� Extracti<strong>on</strong> <str<strong>on</strong>g>of</str<strong>on</strong>g> photoacid and quencher alters the distributi<strong>on</strong> <strong>in</strong> the<br />
resist which could affect pr<str<strong>on</strong>g>of</str<strong>on</strong>g>iles<br />
© 2003 IBM Corporati<strong>on</strong>