Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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Summary<br />
IBM Systems and Technology Group<br />
� Presented a methodology to analyze the impact <str<strong>on</strong>g>of</str<strong>on</strong>g> wett<strong>in</strong>g time<br />
<strong>on</strong> resist pr<str<strong>on</strong>g>of</str<strong>on</strong>g>iles<br />
� A quantifiable, n<strong>on</strong>-l<strong>in</strong>ear <strong>CD</strong> resp<strong>on</strong>se to wett<strong>in</strong>g time was<br />
dem<strong>on</strong>strated<br />
– Resp<strong>on</strong>se was an exp<strong>on</strong>ential decay to a saturati<strong>on</strong> level<br />
– Side wall angle was most sensitive parameter to wett<strong>in</strong>g time<br />
� The impact <str<strong>on</strong>g>of</str<strong>on</strong>g> wett<strong>in</strong>g time <strong>on</strong> <strong>CD</strong> variati<strong>on</strong> was reduced at slow<br />
scan speeds due to saturati<strong>on</strong><br />
� Impact <str<strong>on</strong>g>of</str<strong>on</strong>g> wett<strong>in</strong>g time <strong>on</strong> <strong>CD</strong> variati<strong>on</strong> was resist dependent<br />
25 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
© 2003 IBM Corporati<strong>on</strong>
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