Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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IBM Systems and Technology Group<br />
Impact <str<strong>on</strong>g>of</str<strong>on</strong>g> Resist <strong>on</strong> <strong>CD</strong> Variati<strong>on</strong> (<str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g>)<br />
σ z (wet)<br />
0.5<br />
0.45<br />
0.4<br />
0.35<br />
0.3<br />
0.25<br />
0.2<br />
0.15<br />
0.1<br />
0.05<br />
0<br />
Topcoat TC1, 250 mm/s<br />
Resist A (High Ea)<br />
Resist B (Low Ea)<br />
Impact <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g><br />
wett<strong>in</strong>g time is is<br />
resist<br />
dependent<br />
Top <strong>CD</strong> Middle <strong>CD</strong> Bottom <strong>CD</strong> Side Wall Angle<br />
24 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
A<br />
B<br />
© 2003 IBM Corporati<strong>on</strong>
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