Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
IBM Systems and Technology Group<br />
Impact <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> Resist Pr<str<strong>on</strong>g>of</str<strong>on</strong>g>iles<br />
σ z<br />
1.2<br />
1<br />
0.8<br />
0.6<br />
0.4<br />
0.2<br />
0<br />
Resist A / Topcoat TC1 / 250 mm/s<br />
Top <strong>CD</strong><br />
Middle <strong>CD</strong><br />
Bottom <strong>CD</strong><br />
Side Wall Angle<br />
Raw Intrafield Scan Directi<strong>on</strong> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> Residual<br />
22 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
Side wall angle is is<br />
most sensitive to to<br />
total wett<strong>in</strong>g time<br />
© 2003 IBM Corporati<strong>on</strong>
Change language