Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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IBM Systems and Technology Group<br />
Impact <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> Resist Pr<str<strong>on</strong>g>of</str<strong>on</strong>g>iles<br />
σ z<br />
1.2<br />
1<br />
0.8<br />
0.6<br />
0.4<br />
0.2<br />
0<br />
Resist A / Topcoat TC1 / 250 mm/s<br />
Top <strong>CD</strong><br />
Middle <strong>CD</strong><br />
Bottom <strong>CD</strong><br />
Side Wall Angle<br />
Raw Intrafield Scan Directi<strong>on</strong> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> Residual<br />
22 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
Side wall angle is is<br />
most sensitive to to<br />
total wett<strong>in</strong>g time<br />
© 2003 IBM Corporati<strong>on</strong>