Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
IBM Systems and Technology Group<br />
Analysis <str<strong>on</strong>g>of</str<strong>on</strong>g> <strong>CD</strong> Variati<strong>on</strong><br />
-<br />
Raw Data<br />
Standardize<br />
Intrafield (ACLV)<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
-<br />
350<br />
Interfield (AWLV)<br />
σ =0.3508<br />
z<br />
300 σz = 0.351<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
Scan directi<strong>on</strong><br />
<str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> time<br />
Residual<br />
Illustrati<strong>on</strong>: Resist A / Topcoat TC1, 250 mm/s<br />
B<strong>in</strong><br />
250<br />
200<br />
150<br />
100<br />
50<br />
zWET WET = f(total wett<strong>in</strong>g time)<br />
<str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> C<strong>on</strong>tributi<strong>on</strong><br />
0<br />
-1 -0.5 0 0.5 1 1.5 2<br />
Standardized Variati<strong>on</strong> <strong>in</strong> Top <strong>CD</strong> (nm)<br />
20 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
© 2003 IBM Corporati<strong>on</strong>
Change language